SCHEMBL24944258

SCHEMBL24944258

C=C(F)C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.43

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 6/20 0.43
HTR2A P28223 1/20 0.37
TACR1 P25103 4/20 0.35
HDAC1 Q13547 1/20 0.35
OPRD1 P41143 3/20 0.33
OPRK1 P41145 3/20 0.33
AKT2 P31751 1/20 0.33
AKR1C1 Q04828 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2D6 P10635 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26478543 0.85 OPRM1 (0.43) OPRM1HTR2ATACR1HDAC1OPRD1
SCHEMBL24944261 0.85 OPRM1 (0.46) OPRM1HTR2ATACR1HDAC1OPRD1
SCHEMBL26413279 0.85 OPRM1 (0.43) OPRM1HTR2ATACR1HDAC1OPRD1
SCHEMBL24944864 0.85 OPRM1 (0.46) OPRM1HTR2ATACR1HDAC1OPRD1
SCHEMBL24944256 0.85 OPRM1 (0.40) OPRM1HTR2ATACR1CYP1A2CYP2D6
SCHEMBL26413660 0.84 OPRM1 (0.42) OPRM1HTR2ATACR1HDAC1OPRD1
SCHEMBL24944239 0.83 OPRM1 (0.49) OPRM1HTR2ATACR1HDAC1OPRD1
SCHEMBL26478563 0.82 OPRM1 (0.46) OPRM1HTR2ATACR1HDAC1OPRD1
SCHEMBL24944055 0.82 OPRM1 (0.46) OPRM1TACR1
SCHEMBL373568 0.81 OPRM1 (0.50) OPRM1HTR2ATACR1HDAC1OPRD1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885HTR2A 3805/4885TACR1 2183/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.