SCHEMBL24944261

SCHEMBL24944261

C=C(C)C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.46

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 7/20 0.46
ELANE P08246 1/20 0.40
HTR2A P28223 1/20 0.37
OPRD1 P41143 3/20 0.36
OPRK1 P41145 3/20 0.36
OPRL1 P41146 1/20 0.36
TACR1 P25103 2/20 0.35
HDAC1 Q13547 1/20 0.35
DRD3 P35462 1/20 0.34
SIGMAR1 Q99720 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944239 0.89 OPRM1 (0.49) OPRM1HTR2AOPRD1OPRK1OPRL1
SCHEMBL13347349 0.86 AKR1C1 (0.43) OPRM1ELANEOPRD1OPRK1OPRL1
SCHEMBL27099943 0.86 DRD2 (0.37) OPRM1DRD3
SCHEMBL24944864 0.85 OPRM1 (0.46) OPRM1HTR2AOPRD1OPRK1TACR1
SCHEMBL26413279 0.85 OPRM1 (0.43) OPRM1HTR2AOPRD1OPRK1TACR1
SCHEMBL24944258 0.85 OPRM1 (0.43) OPRM1HTR2AOPRD1OPRK1TACR1
SCHEMBL26478543 0.85 OPRM1 (0.43) OPRM1HTR2AOPRD1OPRK1TACR1
SCHEMBL1130178 0.85 AKR1C1 (0.42) OPRM1ELANEOPRD1OPRK1OPRL1
SCHEMBL11602249 0.84 OPRM1 (0.50) OPRM1HTR2AOPRD1OPRK1OPRL1
SCHEMBL26413338 0.84 OPRM1 (0.45) OPRM1HTR2AOPRD1OPRK1OPRL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11914294-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-02-27 US disclosed
US-11914294-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-02-27 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885ELANE 3291/4885HTR2A 3805/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.