SCHEMBL24944286

SCHEMBL24944286

CN1CCN(Cc2ccc(C(=O)OC3(c4ccccc4)CCNCC3)cc2)CC1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHKA P35790 3/20 0.48
HDAC6 Q9UBN7 2/20 0.46
MC4R P32245 1/20 0.46
KDM1A O60341 1/20 0.44
MAOB P27338 1/20 0.44
RCOR1 Q9UKL0 1/20 0.44
MEN1 O00255 3/20 0.43
KMT2A Q03164 3/20 0.43
ALDH1A1 P00352 3/20 0.43
CYP2C9 P11712 1/20 0.43
TSHR P16473 1/20 0.43
CYP2C19 P33261 1/20 0.43
HIF1A Q16665 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
NPC1 O15118 1/20 0.43
TP53 P04637 1/20 0.43
RAB9A P51151 1/20 0.43
MAPT P10636 1/20 0.43
HDAC1 Q13547 3/20 0.42
HRH3 Q9Y5N1 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944044 0.83 OPRM1 (0.48) MEN1KMT2AALDH1A1CYP2C9CYP2C19
SCHEMBL26413495 0.82 OPRM1 (0.41) KDM1AMAOBRCOR1MEN1KMT2A
SCHEMBL24943659 0.81 OPRM1 (0.42) MEN1KMT2ACYP2C9CYP2C19NPC1
SCHEMBL24944674 0.80 OPRM1 (0.45) MEN1KMT2ACYP2C9CYP2C19L3MBTL1
SCHEMBL26478721 0.79 CES2 (0.44) MEN1KMT2ACYP2C9CYP2C19HDAC1
SCHEMBL6543289 0.79 OPRL1 (0.55) MEN1KMT2AALDH1A1TSHRCYP2C19
SCHEMBL26413939 0.79 OPRM1 (0.41) MEN1KMT2ACYP2C9CYP2C19HDAC1
SCHEMBL24943739 0.79 OPRM1 (0.41) MEN1KMT2ACYP2C9TSHRCYP2C19
SCHEMBL24943664 0.79 OPRM1 (0.46) ALDH1A1TSHRHDAC1
SCHEMBL24944123 0.78 TRPV1 (0.44) MEN1KMT2AALDH1A1CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR CHKA 2321/4885HDAC6 1851/4885MC4R 1027/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.