SCHEMBL26413495

SCHEMBL26413495

O=C(OC1(c2ccccc2)CCNCC1)c1ccc(CCl)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 2/20 0.41
CA1 P00915 2/20 0.40
CA2 P00918 2/20 0.40
HDAC1 Q13547 1/20 0.39
TACR1 P25103 4/20 0.37
SLC6A4 P31645 1/20 0.37
KCNH2 Q12809 1/20 0.37
MEN1 O00255 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2D6 P10635 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
KMT2A Q03164 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
LMNA P02545 1/20 0.35
KDM1A O60341 1/20 0.35
MAOB P27338 1/20 0.35
RCOR1 Q9UKL0 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943659 0.88 OPRM1 (0.42) OPRM1HDAC1TACR1SLC6A4MEN1
SCHEMBL24944044 0.88 OPRM1 (0.48) OPRM1HDAC1TACR1MEN1CYP1A2
SCHEMBL26478721 0.87 CES2 (0.44) OPRM1HDAC1TACR1SLC6A4KCNH2
SCHEMBL24943664 0.86 OPRM1 (0.46) OPRM1HDAC1TACR1SLC6A4LMNA
SCHEMBL24944620 0.85 DRD2 (0.43) OPRM1HDAC1TACR1SLC6A4KMT2A
SCHEMBL26478940 0.85 OPRM1 (0.40) OPRM1HDAC1TACR1KCNH2MEN1
SCHEMBL24944674 0.85 OPRM1 (0.45) OPRM1HDAC1MEN1CYP1A2CYP3A4
SCHEMBL26413939 0.84 OPRM1 (0.41) OPRM1HDAC1TACR1MEN1CYP1A2
SCHEMBL24943739 0.84 OPRM1 (0.41) OPRM1HDAC1MEN1CYP1A2CYP3A4
SCHEMBL24944313 0.84 ESR1 (0.42) OPRM1CA1CA2HDAC1TACR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885CA1 1910/4885CA2 472/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.