SCHEMBL24944317

SCHEMBL24944317

O=C(CCc1ccc(O)cc1)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.40

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 4/20 0.40
TDP1 Q9NUW8 1/20 0.40
TACR1 P25103 1/20 0.39
CYP19A1 P11511 1/20 0.39
CHRM5 P08912 1/20 0.39
CHRM1 P11229 1/20 0.39
CHRM3 P20309 1/20 0.39
TRPV1 Q8NER1 1/20 0.38
DRD3 P35462 1/20 0.38
LMNA P02545 1/20 0.37
APP P05067 1/20 0.37
OPRD1 P41143 3/20 0.37
OPRK1 P41145 3/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944681 0.89 OPRM1 (0.40) OPRM1TDP1TACR1CHRM5CHRM1
SCHEMBL26478945 0.89 MEN1 (0.43) OPRM1TDP1TACR1CHRM5CHRM1
SCHEMBL24944045 0.89 OPRM1 (0.45) OPRM1TDP1TACR1CHRM5CHRM1
SCHEMBL24944042 0.87 FNTA (0.43) OPRM1TACR1OPRD1OPRK1
SCHEMBL26413726 0.85 ALDH1A1 (0.48)
SCHEMBL24944056 0.85 HDAC1 (0.44) OPRM1TDP1TACR1DRD3OPRD1
SCHEMBL24943760 0.84 MAPT (0.44) OPRM1TACR1DRD3
SCHEMBL24943758 0.82 MAPT (0.47) OPRM1
SCHEMBL26479094 0.82 TDP1 (0.45) OPRM1TDP1DRD3
SCHEMBL26413846 0.82 TDP1 (0.45) OPRM1TDP1TACR1DRD3OPRD1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885TDP1 2049/4885TACR1 2183/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.