Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CRBN | Q96SW2 | 8/20 | 0.33 |
| ▸ | DDB1 | Q16531 | 1/20 | 0.32 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24944357 | 0.87 | — | — | |
| SCHEMBL24944360 | 0.86 | — | — | |
| SCHEMBL24944628 | 0.86 | POLB (0.30) | — | |
| SCHEMBL24944358 | 0.85 | OPRK1 (0.33) | — | |
| SCHEMBL24944627 | 0.85 | OPRM1 (0.32) | — | |
| SCHEMBL26479474 | 0.85 | — | — | |
| SCHEMBL26413944 | 0.85 | OPRM1 (0.30) | — | |
| SCHEMBL26413943 | 0.83 | OPRM1 (0.32) | — | |
| SCHEMBL26413959 | 0.82 | RAB9A (0.37) | — | |
| SCHEMBL24943783 | 0.82 | KDM4E (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11644753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-09 | — | — | US | disclosed |
| US-11644753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-09 | — | — | US | disclosed |
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230021453-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11644753-B2 | Resist composition and patterning process | HNRNPU, NSUN2, HNRNPR | CRBN 27/4885DDB1 119/4885PIN1 2460/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.