SCHEMBL24944664

SCHEMBL24944664

Cc1ccccc1CC(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.47

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 6/20 0.47
OPRD1 P41143 3/20 0.40
OPRK1 P41145 3/20 0.40
CTBP2 P56545 1/20 0.40
DRD3 P35462 1/20 0.38
ACAT2 Q9BWD1 1/20 0.37
LMNA P02545 1/20 0.37
TACR1 P25103 1/20 0.36
KDM4E B2RXH2 1/20 0.36
MEN1 O00255 1/20 0.36
ALDH1A1 P00352 1/20 0.36
KMT2A Q03164 1/20 0.36
SLC6A2 P23975 2/20 0.35
SLC6A4 P31645 2/20 0.35
SLC6A3 Q01959 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413741 0.88 OPRM1 (0.43) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL26478738 0.87 OPRM1 (0.44) OPRM1OPRD1OPRK1DRD3LMNA
SCHEMBL24944882 0.86 AKR1B1 (0.45) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL24943731 0.85 USP2 (0.45) OPRM1TACR1KDM4EMEN1KMT2A
SCHEMBL24943645 0.85 OPRM1 (0.41) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL26413815 0.82 TDP1 (0.48) OPRM1LMNAKDM4EALDH1A1KMT2A
SCHEMBL26413533 0.82 OPRM1 (0.40) OPRM1OPRD1OPRK1DRD3LMNA
SCHEMBL24944301 0.82 OPRM1 (0.45) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL24944885 0.82 OPRM1 (0.46) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL26413731 0.82 OPRM1 (0.47) OPRM1OPRD1OPRK1DRD3LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885OPRD1 1348/4885OPRK1 1644/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.