SCHEMBL24944882

SCHEMBL24944882

O=C(Cc1ccccc1O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1B1 P15121 1/20 0.45
OPRM1 P35372 5/20 0.42
OPRD1 P41143 3/20 0.38
OPRK1 P41145 3/20 0.38
DRD3 P35462 1/20 0.37
SLC6A2 P23975 1/20 0.36
SLC6A4 P31645 1/20 0.36
SLC6A3 Q01959 1/20 0.36
TACR1 P25103 3/20 0.35
PTGDR2 Q9Y5Y4 1/20 0.35
HTR2A P28223 1/20 0.33
KDM4E B2RXH2 1/20 0.33
MEN1 O00255 1/20 0.33
ALDH1A1 P00352 1/20 0.33
POLB P06746 1/20 0.33
GAA P10253 1/20 0.33
MAPT P10636 1/20 0.33
THRB P10828 1/20 0.33
DNMT1 P26358 1/20 0.33
RECQL P46063 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943650 0.88 EGFR (0.39) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL24943645 0.86 OPRM1 (0.41) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL26478738 0.86 OPRM1 (0.44) OPRM1OPRD1OPRK1DRD3SLC6A2
SCHEMBL24944664 0.86 OPRM1 (0.47) OPRM1OPRD1OPRK1DRD3SLC6A2
SCHEMBL26413533 0.84 OPRM1 (0.40) OPRM1OPRD1OPRK1DRD3SLC6A2
SCHEMBL26413815 0.84 TDP1 (0.48) OPRM1KDM4EALDH1A1MAPTKMT2A
SCHEMBL24943731 0.84 USP2 (0.45) OPRM1TACR1KDM4EMEN1GAA
SCHEMBL24944885 0.83 OPRM1 (0.46) AKR1B1OPRM1OPRD1OPRK1DRD3
SCHEMBL26413612 0.82 ALDH1A1 (0.43) MEN1ALDH1A1MAPTKMT2AL3MBTL1
SCHEMBL24944042 0.82 FNTA (0.43) OPRM1OPRD1OPRK1TACR1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR AKR1B1 3995/4885OPRM1 775/4885OPRD1 1348/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.