SCHEMBL26413741

SCHEMBL26413741

Cc1ccc(C)c(CC(=O)OC2(c3ccccc3)CCNCC2)c1

nearest known ligand 0.43

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 6/20 0.43
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
TACR1 P25103 3/20 0.38
OPRD1 P41143 3/20 0.37
OPRK1 P41145 3/20 0.37
DRD3 P35462 1/20 0.36
KDM4E B2RXH2 2/20 0.35
HTT P42858 2/20 0.35
ALDH1A1 P00352 1/20 0.35
HPGD P15428 1/20 0.35
KMT2A Q03164 2/20 0.34
MEN1 O00255 1/20 0.34
PARP14 Q460N5 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944664 0.88 OPRM1 (0.47) OPRM1TACR1OPRD1OPRK1DRD3
SCHEMBL24944301 0.83 OPRM1 (0.45) OPRM1TACR1OPRD1OPRK1DRD3
SCHEMBL26413731 0.83 OPRM1 (0.47) OPRM1TACR1OPRD1OPRK1DRD3
SCHEMBL26413730 0.82 OPRM1 (0.44) OPRM1TACR1OPRD1OPRK1
SCHEMBL24944093 0.80 OPRM1 (0.43) OPRM1NPC1TACR1KDM4EHPGD
SCHEMBL24944882 0.79 AKR1B1 (0.45) OPRM1TACR1OPRD1OPRK1DRD3
SCHEMBL24943731 0.79 USP2 (0.45) OPRM1NPC1RAB9ATACR1KDM4E
SCHEMBL24944885 0.79 OPRM1 (0.46) OPRM1TACR1OPRD1OPRK1DRD3
SCHEMBL24944266 0.78 OPRM1 (0.43) OPRM1RAB9ATACR1OPRD1OPRK1
SCHEMBL24943645 0.78 OPRM1 (0.41) OPRM1TACR1OPRD1OPRK1DRD3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885NPC1 4818/4885RAB9A 3924/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.