SCHEMBL24944671

SCHEMBL24944671

COc1ccc(C(O)C(=O)OC2(c3ccccc3)CCNCC2)cc1

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 6/20 0.43
OPRL1 P41146 5/20 0.43
OPRK1 P41145 3/20 0.43
OPRD1 P41143 2/20 0.43
ACP3 P15309 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
TACR1 P25103 1/20 0.37
GRIN2B Q13224 1/20 0.37
NPC1 O15118 1/20 0.37
MAPT P10636 1/20 0.37
RAB9A P51151 1/20 0.37
PAX8 Q06710 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
ALDH1A1 P00352 1/20 0.37
TSHR P16473 1/20 0.37
CHRM5 P08912 1/20 0.36
CHRM1 P11229 1/20 0.36
CHRM3 P20309 1/20 0.36
CNR2 P34972 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943660 0.89 OPRM1 (0.45) OPRM1OPRL1OPRK1ALDH1A1CHRM5
SCHEMBL24944884 0.86 OPRM1 (0.41) OPRM1TACR1GRIN2B
SCHEMBL26478718 0.85 OPRM1 (0.40) OPRM1OPRL1OPRK1OPRD1L3MBTL1
SCHEMBL24944853 0.85 OPRM1 (0.40) OPRM1OPRL1OPRK1OPRD1TACR1
SCHEMBL24943649 0.81 OPRM1 (0.39) OPRM1L3MBTL1MAPTNPSR1TSHR
SCHEMBL26413477 0.80 OPRM1 (0.47) OPRM1OPRL1L3MBTL1TACR1NPC1
SCHEMBL26413266 0.79 OPRM1 (0.49) OPRM1OPRK1OPRD1TACR1ALDH1A1
SCHEMBL24944641 0.78 OPRM1 (0.50) OPRM1OPRK1OPRD1TACR1ALDH1A1
SCHEMBL26413502 0.78 OPRM1 (0.40) OPRM1OPRL1OPRK1OPRD1ACP3
SCHEMBL24943735 0.78 OPRM1 (0.45) OPRM1OPRL1OPRK1OPRD1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885OPRL1 1474/4885OPRK1 1644/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.