SCHEMBL24944853

SCHEMBL24944853

O=C(OC1(c2ccccc2)CCNCC1)C(O)c1ccc(Cl)cc1

nearest known ligand 0.43

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 3/20 0.40
DRD2 P14416 1/20 0.39
PTGDR2 Q9Y5Y4 1/20 0.38
SLC6A2 P23975 1/20 0.38
SLC6A4 P31645 1/20 0.38
SLC6A3 Q01959 1/20 0.38
OPRD1 P41143 1/20 0.37
OPRK1 P41145 1/20 0.37
OPRL1 P41146 1/20 0.37
TACR1 P25103 1/20 0.35
CNR1 P21554 1/20 0.34
HDAC1 Q13547 1/20 0.34
APP P05067 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943660 0.91 OPRM1 (0.45) OPRM1OPRK1OPRL1HDAC1
SCHEMBL24944884 0.89 OPRM1 (0.41) OPRM1TACR1HDAC1
SCHEMBL26478718 0.88 OPRM1 (0.40) OPRM1SLC6A4OPRD1OPRK1OPRL1
SCHEMBL26413502 0.87 OPRM1 (0.40) OPRM1SLC6A2SLC6A4SLC6A3OPRD1
SCHEMBL26478765 0.86 OPRM1 (0.40) OPRM1DRD2PTGDR2SLC6A2SLC6A4
SCHEMBL24944671 0.85 OPRM1 (0.43) OPRM1OPRD1OPRK1OPRL1TACR1
SCHEMBL24943746 0.84 OPRM1 (0.41) OPRM1DRD2PTGDR2SLC6A2SLC6A4
SCHEMBL24943649 0.83 OPRM1 (0.39) OPRM1SLC6A2HDAC1
SCHEMBL26479235 0.82 SLC6A3 (0.42) OPRM1SLC6A2SLC6A4SLC6A3
SCHEMBL24944620 0.79 DRD2 (0.43) OPRM1DRD2PTGDR2SLC6A2SLC6A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885DRD2 1738/4885PTGDR2 2954/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.