SCHEMBL24944672

SCHEMBL24944672

CCCOc1ccc(C(=O)OC2(c3ccccc3)CCNCC2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.46
MAPT P10636 7/20 0.45
RAB9A P51151 4/20 0.45
ALDH1A1 P00352 5/20 0.43
OPRM1 P35372 1/20 0.43
SMN1; SMN2 Q16637 5/20 0.43
NPC1 O15118 1/20 0.43
NFKB1 P19838 1/20 0.43
NFKB2 Q00653 1/20 0.43
RELA Q04206 1/20 0.43
LMNA P02545 3/20 0.43
CYP1A2 P05177 1/20 0.42
CYP3A4 P08684 1/20 0.42
CYP2D6 P10635 1/20 0.42
CYP2C9 P11712 1/20 0.42
CYP2C19 P33261 1/20 0.42
HTT P42858 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
PLK1 P53350 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944656 0.91 OPRM1 (0.48) MAPTRAB9AALDH1A1OPRM1SMN1; SMN2
SCHEMBL24943714 0.89 RARB (0.54) TSHRMAPTRAB9AALDH1A1SMN1; SMN2
SCHEMBL24943775 0.85 PLA2G4B (0.49) RAB9ANPC1HPGDMEN1KMT2A
SCHEMBL24944099 0.85 NR4A1 (0.51) RAB9AALDH1A1SMN1; SMN2NPC1LMNA
SCHEMBL24944044 0.84 OPRM1 (0.48) RAB9AALDH1A1OPRM1SMN1; SMN2LMNA
SCHEMBL26413477 0.84 OPRM1 (0.47) MAPTRAB9AALDH1A1OPRM1SMN1; SMN2
SCHEMBL24944674 0.83 OPRM1 (0.45) RAB9AOPRM1SMN1; SMN2NPC1LMNA
SCHEMBL24943750 0.83 PARP10 (0.43) OPRM1SMN1; SMN2
SCHEMBL24943664 0.82 OPRM1 (0.46) TSHRALDH1A1OPRM1LMNA
SCHEMBL24944860 0.81 OPRM1 (0.47) MAPTRAB9AOPRM1SMN1; SMN2NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR TSHR 3385/4885MAPT 2648/4885RAB9A 3924/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.