SCHEMBL24944656

SCHEMBL24944656

CCOc1ccc(C(=O)OC2(c3ccccc3)CCNCC2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 1/20 0.48
MAOA P21397 1/20 0.45
MAOB P27338 1/20 0.45
MAPT P10636 4/20 0.42
RAB9A P51151 4/20 0.42
LMNA P02545 3/20 0.42
NPC1 O15118 3/20 0.42
KMT2A Q03164 3/20 0.42
ALDH1A1 P00352 2/20 0.42
SCN1A P35498 1/20 0.42
SCN2A Q99250 1/20 0.42
SCN3A Q9NY46 1/20 0.42
MAPK1 P28482 2/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
PARP10 Q53GL7 1/20 0.41
PLA2G4B P0C869 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
CCNC P24863 1/20 0.41
CDK8 P49336 1/20 0.41
PKM P14618 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944672 0.91 TSHR (0.46) OPRM1MAPTRAB9ALMNANPC1
SCHEMBL24944099 0.87 NR4A1 (0.51) MAOBRAB9ALMNANPC1ALDH1A1
SCHEMBL24944044 0.86 OPRM1 (0.48) OPRM1RAB9ALMNAKMT2AALDH1A1
SCHEMBL26413477 0.86 OPRM1 (0.47) OPRM1MAOBMAPTRAB9ANPC1
SCHEMBL24943714 0.85 RARB (0.54) MAPTRAB9ALMNAALDH1A1PLA2G4B
SCHEMBL24943750 0.85 PARP10 (0.43) OPRM1PARP10SMN1; SMN2
SCHEMBL24943664 0.84 OPRM1 (0.46) OPRM1LMNAALDH1A1
SCHEMBL24944860 0.83 OPRM1 (0.47) OPRM1MAPTRAB9ANPC1KMT2A
SCHEMBL24944081 0.83 OPRM1 (0.44) OPRM1MAOBMAPTRAB9ALMNA
SCHEMBL24943754 0.82 SMN1; SMN2 (0.43) OPRM1MAPTALDH1A1SCN1ASCN2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885MAOA 4541/4885MAOB 4669/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.