SCHEMBL24944860

SCHEMBL24944860

Cc1ccc(C(=O)OC2(c3ccccc3)CCNCC2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 3/20 0.47
GABRD O14764 1/20 0.44
GABRA1 P14867 1/20 0.44
GABRB1 P18505 1/20 0.44
GABRA5 P31644 1/20 0.44
GABRA3 P34903 1/20 0.44
GABRA2 P47869 1/20 0.44
GABRB2 P47870 1/20 0.44
GABRA4 P48169 1/20 0.44
NPC1 O15118 2/20 0.41
RAB9A P51151 2/20 0.41
DRD2 P14416 1/20 0.41
DRD4 P21917 1/20 0.41
DRD3 P35462 1/20 0.41
CES2 O00748 1/20 0.40
CES1 P23141 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
MEN1 O00255 4/20 0.39
KMT2A Q03164 4/20 0.39
CYP2D6 P10635 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943664 0.90 OPRM1 (0.46) OPRM1DRD3TDP1HDAC1TACR1
SCHEMBL24944081 0.89 OPRM1 (0.44) OPRM1NPC1RAB9ATDP1KMT2A
SCHEMBL24944091 0.88 OPRM1 (0.46) OPRM1GABRDGABRA1GABRB1GABRA5
SCHEMBL24944340 0.87 AKR1C3 (0.49) OPRM1GABRDGABRA1GABRB1GABRA5
SCHEMBL24944313 0.87 ESR1 (0.42) OPRM1CES2TDP1KMT2AHDAC1
SCHEMBL26413775 0.87 ALDH1A1 (0.46) OPRM1DRD3TDP1HDAC1OPRD1
SCHEMBL24943754 0.87 SMN1; SMN2 (0.43) OPRM1CYP2D6HDAC1CYP1A2OPRD1
SCHEMBL24944044 0.86 OPRM1 (0.48) OPRM1RAB9ADRD3MEN1KMT2A
SCHEMBL26413477 0.86 OPRM1 (0.47) OPRM1NPC1RAB9ACES2CES1
SCHEMBL24944620 0.86 DRD2 (0.43) OPRM1DRD2DRD4DRD3CES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885GABRD 835/4885GABRA1 1177/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.