SCHEMBL24944676

SCHEMBL24944676

O=C(CCCOc1ccccc1)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.43
TDP1 Q9NUW8 1/20 0.43
SMN1; SMN2 Q16637 4/20 0.42
NPC1 O15118 3/20 0.42
RAB9A P51151 3/20 0.42
HPGD P15428 2/20 0.42
OPRM1 P35372 1/20 0.41
ALDH1A1 P00352 2/20 0.41
DRD3 P35462 1/20 0.41
MAPT P10636 2/20 0.40
TSHR P16473 2/20 0.39
LMNA P02545 1/20 0.39
HSD17B10 Q99714 1/20 0.39
HDAC1 Q13547 2/20 0.39
HDAC2 Q92769 2/20 0.39
TAAR1 Q96RJ0 1/20 0.39
GAA P10253 1/20 0.38
NAMPT P43490 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943759 0.96 HDAC1 (0.44) L3MBTL1TDP1SMN1; SMN2NPC1RAB9A
SCHEMBL24944669 0.94 OPRM1 (0.42) SMN1; SMN2NPC1RAB9AHPGDOPRM1
SCHEMBL26413963 0.88 OPRM1 (0.46) OPRM1DRD3
SCHEMBL26413968 0.88 OPRM1 (0.46) OPRM1DRD3
SCHEMBL24944578 0.87 OPRM1 (0.43) OPRM1DRD3
SCHEMBL26478570 0.87 OPRM1 (0.45) OPRM1DRD3
SCHEMBL24944582 0.86 OPRM1 (0.42) OPRM1DRD3
SCHEMBL24944608 0.85 OPRM1 (0.44) L3MBTL1OPRM1ALDH1A1DRD3GAA
SCHEMBL26413333 0.85 OPRM1 (0.41) OPRM1DRD3
SCHEMBL26413217 0.84 OPRM1 (0.49) OPRM1DRD3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR L3MBTL1 2012/4885TDP1 2049/4885SMN1; SMN2 1285/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.