SCHEMBL24944608

SCHEMBL24944608

O=C(COc1ccccc1)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.44

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 5/20 0.44
ALOX15 P16050 1/20 0.44
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
GAA P10253 2/20 0.41
OPRD1 P41143 3/20 0.40
OPRK1 P41145 3/20 0.40
USP2 O75604 1/20 0.39
ALDH1A1 P00352 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
DRD3 P35462 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944653 0.91 OPRM1 (0.45) OPRM1MEN1KMT2AGAAOPRD1
SCHEMBL26478741 0.91 GPR183 (0.44) OPRM1MEN1KMT2AGAAALDH1A1
SCHEMBL24944847 0.91 KMT2A (0.44) OPRM1MEN1KMT2AALDH1A1L3MBTL1
SCHEMBL24944278 0.89 MAPT (0.47) OPRM1KMT2AGAAOPRD1ALDH1A1
SCHEMBL24944712 0.87 PTPN7 (0.51) MEN1KMT2AGAAALDH1A1
SCHEMBL26413607 0.87 ALDH1A1 (0.47) KMT2AALDH1A1
SCHEMBL24944669 0.86 OPRM1 (0.42) OPRM1MEN1KMT2AOPRD1OPRK1
SCHEMBL24944676 0.85 L3MBTL1 (0.43) OPRM1GAAALDH1A1L3MBTL1DRD3
SCHEMBL24944596 0.84 OPRM1 (0.48) OPRM1OPRD1OPRK1ALDH1A1DRD3
SCHEMBL24943759 0.84 HDAC1 (0.44) OPRM1ALDH1A1L3MBTL1DRD3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885ALOX15 1246/4885MEN1 3578/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.