SCHEMBL24944669

SCHEMBL24944669

O=C(CCOc1ccccc1)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 5/20 0.42
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
DRD3 P35462 1/20 0.39
TSHR P16473 1/20 0.39
RECQL P46063 1/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
OPRD1 P41143 3/20 0.38
OPRK1 P41145 3/20 0.38
HTR1A P08908 3/20 0.38
ADRA1D P25100 2/20 0.38
ADRA1B P35368 2/20 0.38
PKM P14618 1/20 0.38
F2 P00734 1/20 0.37
NPC1 O15118 1/20 0.37
HPGD P15428 1/20 0.37
RAB9A P51151 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944676 0.94 L3MBTL1 (0.43) OPRM1DRD3TSHRNPC1HPGD
SCHEMBL24943759 0.92 HDAC1 (0.44) OPRM1DRD3NPC1HPGDRAB9A
SCHEMBL24944304 0.89 LMNA (0.43) OPRM1TSHRKMT2AHTR1AADRA1D
SCHEMBL24944608 0.86 OPRM1 (0.44) OPRM1DRD3MEN1KMT2AOPRD1
SCHEMBL26413761 0.84 OPRM1 (0.40) OPRM1CYP3A4DRD3TSHROPRD1
SCHEMBL26413963 0.83 OPRM1 (0.46) OPRM1DRD3OPRD1OPRK1
SCHEMBL26413968 0.83 OPRM1 (0.46) OPRM1DRD3OPRD1OPRK1
SCHEMBL24944578 0.83 OPRM1 (0.43) OPRM1DRD3OPRD1OPRK1
SCHEMBL24944253 0.82 OPRM1 (0.45) OPRM1DRD3OPRD1OPRK1
SCHEMBL25475280 0.82 OPRM1 (0.45) OPRM1DRD3OPRD1OPRK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885CYP1A2 4868/4885CYP3A4 4746/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.