SCHEMBL24944933

SCHEMBL24944933

CCOC(=O)c1ccc(CC(=O)OC2(c3ccccc3)CCNCC2)cc1OCC

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 1/20 0.44
GLS O94925 1/20 0.39
CYP2D6 P10635 2/20 0.39
SLC6A2 P23975 1/20 0.39
SLC6A4 P31645 1/20 0.39
SLC6A3 Q01959 1/20 0.39
LMNA P02545 2/20 0.36
CYP3A4 P08684 2/20 0.36
SLC22A1 O15245 1/20 0.36
ABCC3 O15438 1/20 0.36
ABCC4 O15439 1/20 0.36
NR1I2 O75469 1/20 0.36
ABCB11 O95342 1/20 0.36
ADORA3 P0DMS8 1/20 0.36
HTR2A P28223 1/20 0.36
MAPK1 P28482 1/20 0.36
ADRA1A P35348 1/20 0.36
PTGS2 P35354 1/20 0.36
PDE4D Q08499 1/20 0.36
ABCC8 Q09428 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413795 0.88 OPRM1 (0.44) OPRM1LMNAHPGDMEN1KMT2A
SCHEMBL24944474 0.80 OPRM1 (0.44) OPRM1LMNAMAPK1KMT2ASMN1; SMN2
SCHEMBL24944661 0.78 OPRM1 (0.48) OPRM1SLC6A2SLC6A4SLC6A3HPGD
SCHEMBL26413731 0.78 OPRM1 (0.47) OPRM1LMNAADRA1AKMT2ASMN1; SMN2
SCHEMBL24944048 0.78 GAA (0.51) CYP3A4GAATDP1TSHRCYP1A2
SCHEMBL24944922 0.77 NPC1 (0.48) CYP3A4HPGDMEN1KMT2ASMN1; SMN2
SCHEMBL26413730 0.77 OPRM1 (0.44) OPRM1
SCHEMBL5162366 0.76 TDP1 (0.48) GLSLMNACYP3A4HPGDSMN1; SMN2
SCHEMBL24944885 0.76 OPRM1 (0.46) OPRM1MAPK1SMN1; SMN2TSHR
SCHEMBL24943646 0.76 ERCC1 (0.44) OPRM1LMNAHPGDGAATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885GLS 4455/4885CYP2D6 4099/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.