SCHEMBL26413795

SCHEMBL26413795

CCOc1ccc(CC(=O)OC2(c3ccccc3)CCNCC2)cc1OCC

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 1/20 0.44
ALDH1A1 P00352 9/20 0.43
HPGD P15428 6/20 0.43
MAPT P10636 5/20 0.43
KDM4E B2RXH2 5/20 0.43
HTT P42858 1/20 0.43
CYP1A2 P05177 1/20 0.43
CYP2C9 P11712 1/20 0.43
CYP2C19 P33261 1/20 0.43
LMNA P02545 2/20 0.42
POLB P06746 2/20 0.41
THRB P10828 1/20 0.41
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39
TAAR1 Q96RJ0 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
MAPK10 P53779 1/20 0.38
GAA P10253 1/20 0.38
CASP1 P29466 1/20 0.38
CASP7 P55210 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944933 0.88 OPRM1 (0.44) OPRM1HPGDCYP1A2CYP2C9CYP2C19
SCHEMBL24944922 0.86 NPC1 (0.48) HPGDCYP1A2CYP2C19MEN1KMT2A
SCHEMBL24944474 0.85 OPRM1 (0.44) OPRM1ALDH1A1KDM4ELMNAKMT2A
SCHEMBL24944048 0.83 GAA (0.51) ALDH1A1CYP1A2CYP2C19GAA
SCHEMBL24943732 0.83 GAA (0.51) OPRM1ALDH1A1HPGDMAPTKDM4E
SCHEMBL26478951 0.82 ALDH1A1 (0.44) OPRM1ALDH1A1HPGDMAPTKDM4E
SCHEMBL24944263 0.82 ALDH1A1 (0.44) OPRM1ALDH1A1CYP1A2CYP2C19POLB
SCHEMBL24944885 0.81 OPRM1 (0.46) OPRM1ALDH1A1L3MBTL1
SCHEMBL24943646 0.81 ERCC1 (0.44) OPRM1HPGDMAPTKDM4ELMNA
SCHEMBL24944711 0.81 SLC6A4 (0.41) OPRM1CYP1A2MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885ALDH1A1 4767/4885HPGD 4346/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.