SCHEMBL24943646

SCHEMBL24943646

O=C(Cc1ccc(O)c(O)c1)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ERCC1 P07992 4/20 0.44
ERCC4 Q92889 4/20 0.44
KDM4E B2RXH2 1/20 0.43
RGS12 O14924 1/20 0.43
LMNA P02545 1/20 0.43
POLB P06746 1/20 0.43
GAA P10253 1/20 0.43
MAPT P10636 1/20 0.43
HPGD P15428 1/20 0.43
TSHR P16473 1/20 0.43
NFKB1 P19838 1/20 0.43
APEX1 P27695 1/20 0.43
THPO P40225 1/20 0.43
BLM P54132 1/20 0.43
GNAI1 P63096 1/20 0.43
PMP22 Q01453 1/20 0.43
HIF1A Q16665 1/20 0.43
HSD17B10 Q99714 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
YWHAG P61981 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944632 0.90 CA2 (0.47) OPRM1TACR1
SCHEMBL24944048 0.88 GAA (0.51) GAATSHRNFKB1TDP1
SCHEMBL24943732 0.88 GAA (0.51) KDM4ELMNAGAAMAPTHPGD
SCHEMBL24944042 0.86 FNTA (0.43) OPRM1TACR1OPRD1OPRK1
SCHEMBL24944885 0.86 OPRM1 (0.46) TSHROPRM1TACR1OPRD1OPRK1
SCHEMBL24944711 0.85 SLC6A4 (0.41) OPRM1TACR1BCHE
SCHEMBL24944886 0.85 TACR1 (0.41) OPRM1TACR1OPRD1OPRK1
SCHEMBL24944096 0.84 ALDH1A1 (0.42) KDM4ETSHRBLMHSD17B10
SCHEMBL24943729 0.84 OPRM1 (0.42) OPRM1TACR1OPRD1OPRK1
SCHEMBL26413489 0.82 PTGDR2 (0.43) MAPTTDP1OPRM1TACR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ERCC1 1135/4885ERCC4 1880/4885KDM4E 1069/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.