Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 7/20 | 0.72 |
| ▸ | RAB9A | P51151 | 6/20 | 0.72 |
| ▸ | MEN1 | O00255 | 5/20 | 0.72 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.72 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.72 |
| ▸ | MAPK1 | P28482 | 4/20 | 0.72 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.72 |
| ▸ | RXFP1 | Q9HBX9 | 2/20 | 0.72 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.63 |
| ▸ | ATM | Q13315 | 2/20 | 0.63 |
| ▸ | USP2 | O75604 | 1/20 | 0.63 |
| ▸ | CTNNB1 | P35222 | 1/20 | 0.63 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.63 |
| ▸ | NPC1 | O15118 | 6/20 | 0.62 |
| ▸ | LMNA | P02545 | 3/20 | 0.62 |
| ▸ | PKM | P14618 | 2/20 | 0.62 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.60 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.56 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.56 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.56 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2494584 | 1.00 | MAPT (0.72) | MAPTRAB9AMEN1KMT2AKDM4E | |
| SCHEMBL2394869 | 0.84 | RAB9A (1.00) | MAPTRAB9AMEN1KMT2AKDM4E | |
| SCHEMBL1348643 | 0.84 | RAB9A (1.00) | MAPTRAB9AMEN1KMT2AKDM4E | |
| SCHEMBL9617200 | 0.84 | RAB9A (0.73) | MAPTRAB9AMEN1KMT2AKDM4E | |
| SCHEMBL8822081 | 0.84 | RAB9A (0.73) | MAPTRAB9AMEN1KMT2AKDM4E | |
| SCHEMBL6818840 | 0.83 | RAB9A (0.86) | MAPTRAB9AMEN1KMT2AKDM4E | |
| SCHEMBL8713845 | 0.83 | RAB9A (0.72) | MAPTRAB9AMEN1KMT2AKDM4E | |
| SCHEMBL9170780 | 0.83 | RAB9A (0.89) | MAPTRAB9AMEN1KMT2AKDM4E | |
| SCHEMBL9170782 | 0.83 | RAB9A (0.89) | MAPTRAB9AMEN1KMT2AKDM4E | |
| SCHEMBL11116914 | 0.82 | MEN1 (0.57) | MAPTRAB9AMEN1KMT2AKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4985470-A | Three component photoinitiator system, printing plates, photoresists, inks, paints, adhesives | MITSUBISHI KASEI CORPORATION (JP) | 1991-01-15 | — | — | US | claimed |
| WO-2020162630-A1 | METHOD FOR PRODUCING ORGANIC COMPOUND | ダイキン工業株式会社 | 2020-08-13 | — | — | WO | disclosed |
| US-8575288-B2 | Photocurable resin composition for forming overcoats RGB pixels black matrixes or spacers in color filter production, and color filters | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8029877-B2 | Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-20100238388-A1 | CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-09-23 | — | — | US | disclosed |
| US-7537810-B2 | Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-05-26 | — | — | US | disclosed |
| US-7399574-B2 | Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-07-15 | — | — | US | disclosed |
| US-7371783-B2 | Alkali-soluble maleimide copolymer and liquid crystal display comprising the same | NIPPON SHOKUBAI CO., LTD. (JP) | 2008-05-13 | — | — | US | disclosed |
| US-20060229376-A1 | Curable resin composition, photosensitive pattern-forming curable resin composition,color filter, substrate for liquid crystalline panel, and liquid crystalline panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2006-10-12 | — | — | US | disclosed |
| US-20050074563-A1 | Alkali-soluble maleimide copolymer and liquid crystal display comprising the same | DAINIPPON PRINTING CO., LTD. (JP) | 2005-04-07 | — | — | US | disclosed |
| US-20030118922-A1 | Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2003-06-26 | — | — | US | disclosed |
| US-4987056-A | IMPROVED SENSITIVITY TO VISIBLE LIGHT | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 1991-01-22 | — | — | US | disclosed |
| US-4985470-A | Three component photoinitiator system, printing plates, photoresists, inks, paints, adhesives | MITSUBISHI KASEI CORPORATION (JP) | 1991-01-15 | — | — | US | disclosed |
| EP-0107792-B1 | PHOTOPOLYMERIZABLE COMPOSITIONS | MITSUBISHI KASEI CORPORATION (JP) | 1985-12-27 | — | — | EP | disclosed |
| EP-0107792-A1 | Photopolymerizable compositions | MITSUBISHI KASEI CORPORATION (JP) | 1984-05-09 | — | — | EP | disclosed |