SCHEMBL2494584

SCHEMBL2494584

CCN(CC)c1ccc(C=Cc2ccc3ccccc3n2)cc1

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 7/20 0.72
RAB9A P51151 6/20 0.72
MEN1 O00255 5/20 0.72
KMT2A Q03164 5/20 0.72
KDM4E B2RXH2 5/20 0.72
MAPK1 P28482 4/20 0.72
L3MBTL1 Q9Y468 4/20 0.72
RXFP1 Q9HBX9 2/20 0.72
ALDH1A1 P00352 2/20 0.63
ATM Q13315 2/20 0.63
USP2 O75604 1/20 0.63
CTNNB1 P35222 1/20 0.63
TDP1 Q9NUW8 1/20 0.63
NPC1 O15118 6/20 0.62
LMNA P02545 3/20 0.62
PKM P14618 2/20 0.62
SMN1; SMN2 Q16637 5/20 0.60
NPSR1 Q6W5P4 2/20 0.56
CYP1A2 P05177 2/20 0.56
CYP2C19 P33261 2/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2494581 1.00 MAPT (0.72) MAPTRAB9AMEN1KMT2AKDM4E
SCHEMBL2394869 0.84 RAB9A (1.00) MAPTRAB9AMEN1KMT2AKDM4E
SCHEMBL1348643 0.84 RAB9A (1.00) MAPTRAB9AMEN1KMT2AKDM4E
SCHEMBL9617200 0.84 RAB9A (0.73) MAPTRAB9AMEN1KMT2AKDM4E
SCHEMBL8822081 0.84 RAB9A (0.73) MAPTRAB9AMEN1KMT2AKDM4E
SCHEMBL6818840 0.83 RAB9A (0.86) MAPTRAB9AMEN1KMT2AKDM4E
SCHEMBL8713845 0.83 RAB9A (0.72) MAPTRAB9AMEN1KMT2AKDM4E
SCHEMBL9170780 0.83 RAB9A (0.89) MAPTRAB9AMEN1KMT2AKDM4E
SCHEMBL9170782 0.83 RAB9A (0.89) MAPTRAB9AMEN1KMT2AKDM4E
SCHEMBL11116914 0.82 MEN1 (0.57) MAPTRAB9AMEN1KMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4985470-A Three component photoinitiator system, printing plates, photoresists, inks, paints, adhesives MITSUBISHI KASEI CORPORATION (JP) 1991-01-15 US claimed
US-12559468-B2 Method for producing organic compound DAIKIN INDUSTRIES, LTD. (JP) 2026-02-24 US disclosed
CN-118812310-A Method for producing organic compound 大金工业株式会社 2024-10-22 CN disclosed
EP-4257576-A2 METHOD FOR PRODUCING ORGANIC COMPOUND Daikin Industries, Ltd. (JP) 2023-10-11 EP disclosed
EP-3922625-A1 METHOD FOR PRODUCING ORGANIC COMPOUND DAIKIN INDUSTRIES, LTD. (JP) 2021-12-15 EP disclosed
US-20210371391-A1 METHOD FOR PRODUCING ORGANIC COMPOUND DAIKIN INDUSTRIES, LTD. (JP) 2021-12-02 US disclosed
CN-113412249-A Method for producing organic compound 大金工业株式会社 2021-09-17 CN disclosed
WO-2020162630-A1 METHOD FOR PRODUCING ORGANIC COMPOUND ダイキン工業株式会社 2020-08-13 WO disclosed
US-8575288-B2 Photocurable resin composition for forming overcoats RGB pixels black matrixes or spacers in color filter production, and color filters DAI NIPPON PRINTING CO., LTD. (JP) 2013-11-05 US disclosed
US-8029877-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2011-10-04 US disclosed
US-20030118922-A1 Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2003-06-26 US disclosed
US-6582862-B1 Curable resin comprising polymer having main chain comprising constitutional unit having acid group and one having hydroxyl group, wherein isocyanate compound containing radical polymerizable group is bonded with acid and/or hydroxy groups DAI NIPPON PRINTING CO., LTD. (JP) 2003-06-24 US disclosed
WO-2003027156-A1 ALKALI-SOLUBLE MALEIMIDE COPOLYMER AND LIQUID CRYSTAL DISPLAY COMPRISING THE SAME DAINIPPON PRINTING CO., LTD. (JP) 2003-04-03 WO disclosed
EP-1141063-A1 HIGH PHOTO-SENSITIVITY CURABLE RESIN, PHOTO-CURABLE RESIN COMPOSITION, PRODUCTION METHOD THEREOF, COLOR FILTER AND LIQUID CRYSTAL DISPLAY PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2001-10-10 EP disclosed
WO-2001027182-A1 HIGH PHOTO-SENSITIVITY CURABLE RESIN, PHOTO-CURABLE RESIN COMPOSITION, PRODUCTION METHOD THEREOF, COLOR FILTER AND LIQUID CRYSTAL DISPLAY PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2001-04-19 WO disclosed
EP-1076070-A2 Highly stable resin, hardenable resin composition, production method therefor, color filter and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2001-02-14 EP disclosed
US-4987056-A IMPROVED SENSITIVITY TO VISIBLE LIGHT TOYO BOSEKI KABUSHIKI KAISHA (JP) 1991-01-22 US disclosed
US-4985470-A Three component photoinitiator system, printing plates, photoresists, inks, paints, adhesives MITSUBISHI KASEI CORPORATION (JP) 1991-01-15 US disclosed
EP-0107792-B1 PHOTOPOLYMERIZABLE COMPOSITIONS MITSUBISHI KASEI CORPORATION (JP) 1985-12-27 EP disclosed
EP-0107792-A1 Photopolymerizable compositions MITSUBISHI KASEI CORPORATION (JP) 1984-05-09 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210371391-A1 METHOD FOR PRODUCING ORGANIC COMPOUND PHF2, CYP2F1, INF2 MAPT 3984/4885RAB9A 3103/4885MEN1 202/4885
US-12559468-B2 Method for producing organic compound FOXM1, FOXO3, FOXO1 MAPT 4434/4885RAB9A 1260/4885MEN1 693/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.