SCHEMBL24948265

SCHEMBL24948265

C=Cc1ccc(C(=O)OC(C)(C)C(=C)C)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 5/20 0.39
ADRB1 P08588 5/20 0.39
ADRB3 P13945 5/20 0.39
ALDH1A1 P00352 2/20 0.39
TAS1R3 Q7RTX0 2/20 0.37
TAS1R1 Q7RTX1 2/20 0.37
ELANE P08246 1/20 0.36
CA1 P00915 2/20 0.35
CA2 P00918 2/20 0.35
CA12 O43570 1/20 0.35
CA9 Q16790 1/20 0.35
CA14 Q9ULX7 1/20 0.35
GRIN2D O15399 1/20 0.34
GRIN3B O60391 1/20 0.34
GRIN1 Q05586 1/20 0.34
GRIN2A Q12879 1/20 0.34
GRIN2B Q13224 1/20 0.34
GRIN2C Q14957 1/20 0.34
GRIN3A Q8TCU5 1/20 0.34
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL394001 0.83 CA1 (0.49) ADRB2ADRB1ADRB3ALDH1A1TAS1R3
SCHEMBL4006994 0.81 TAS1R3 (0.47) ADRB2ADRB1ADRB3ALDH1A1TAS1R3
SCHEMBL24948275 0.80 ALDH1A1 (0.41) ADRB2ADRB1ADRB3ALDH1A1TAS1R3
SCHEMBL13883934 0.79 ALDH1A1 (0.47) ALDH1A1TAS1R3TAS1R1ELANETDP1
SCHEMBL24948262 0.79 TAS1R3 (0.43) ADRB2ADRB1ADRB3ALDH1A1TAS1R3
SCHEMBL24948273 0.78 TAS1R3 (0.41) ADRB2ADRB1ADRB3ALDH1A1TAS1R3
4-Vinylphenol SCHEMBL6903536 0.77 MIF (0.47) ADRB2ADRB1ADRB3ALDH1A1ELANE
SCHEMBL24948271 0.77 CYP1A2 (0.50) ADRB2ADRB1ADRB3ALDH1A1TAS1R3
SCHEMBL24948274 0.77 ALDH1A1 (0.39) ADRB2ADRB1ADRB3ALDH1A1TAS1R3
SCHEMBL24948260 0.76 TAS1R3 (0.42) ADRB2ADRB1ADRB3ALDH1A1TAS1R3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023008347-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2023-02-02 WO disclosed
WO-2023008346-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2023-02-02 WO disclosed