SCHEMBL24948274

SCHEMBL24948274

C=Cc1ccc(C(=O)OC(C)(C)/C=C/C)cc1

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.39
TAS1R3 Q7RTX0 2/20 0.37
TAS1R1 Q7RTX1 2/20 0.37
ADRB2 P07550 3/20 0.36
ADRB1 P08588 3/20 0.36
ADRB3 P13945 3/20 0.36
PTPN1 P18031 1/20 0.36
ELANE P08246 1/20 0.36
CA1 P00915 4/20 0.35
CA2 P00918 4/20 0.35
CA12 O43570 2/20 0.35
CA9 Q16790 2/20 0.35
CA14 Q9ULX7 2/20 0.35
CA7 P43166 1/20 0.34
MAPK1 P28482 1/20 0.34
TRPA1 O75762 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
SNCA P37840 1/20 0.33
MAPT P10636 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24948275 0.87 ALDH1A1 (0.41) ALDH1A1TAS1R3TAS1R1ADRB2ADRB1
SCHEMBL394001 0.83 CA1 (0.49) ALDH1A1TAS1R3TAS1R1ADRB2ADRB1
SCHEMBL24948272 0.82 TAS1R3 (0.40) ALDH1A1TAS1R3TAS1R1ADRB2ADRB1
4-Vinylphenol SCHEMBL6903536 0.81 MIF (0.47) ALDH1A1ADRB2ADRB1ADRB3ELANE
SCHEMBL24948262 0.79 TAS1R3 (0.43) ALDH1A1TAS1R3TAS1R1ADRB2ADRB1
SCHEMBL4006994 0.77 TAS1R3 (0.47) ALDH1A1TAS1R3TAS1R1ADRB2ADRB1
SCHEMBL24948265 0.77 ADRB2 (0.39) ALDH1A1TAS1R3TAS1R1ADRB2ADRB1
SCHEMBL24948271 0.77 CYP1A2 (0.50) ALDH1A1TAS1R3TAS1R1ADRB2ADRB1
SCHEMBL24985304 0.77 TAS1R3 (0.43) ALDH1A1TAS1R3TAS1R1ADRB2ADRB1
SCHEMBL10424969 0.77 ELANE (0.42) ALDH1A1ADRB2ADRB1ADRB3ELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023008346-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2023-02-02 WO disclosed
WO-2023008347-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2023-02-02 WO disclosed