SCHEMBL24955836

SCHEMBL24955836

CC(=O)Oc1cc2ccccc2c2ccccc12

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 3/20 0.60
TSHR P16473 2/20 0.51
SLC22A6 Q4U2R8 1/20 0.49
GPR84 Q9NQS5 1/20 0.49
MAPT P10636 5/20 0.47
ALDH1A1 P00352 4/20 0.47
HPGD P15428 3/20 0.47
KDM4E B2RXH2 4/20 0.46
BLM P54132 2/20 0.46
TDP1 Q9NUW8 2/20 0.46
GAA P10253 2/20 0.46
POLB P06746 2/20 0.46
KMT2A Q03164 2/20 0.46
APEX1 P27695 1/20 0.46
RECQL P46063 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
HSD17B10 Q99714 2/20 0.46
ESR1 P03372 1/20 0.46
ITGB3 P05106 1/20 0.46
ITGA2B P08514 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13374671 0.84 GPR84 (0.49) HTTTSHRGPR84MAPTALDH1A1
SCHEMBL2849408 0.83 GPR84 (0.50) HTTGPR84MAPTALDH1A1HPGD
SCHEMBL27656394 0.82 HTT (0.53) HTTTSHRSLC22A6MAPTALDH1A1
SCHEMBL8582319 0.82 KDM4E (0.59) HTTTSHRSLC22A6MAPTALDH1A1
SCHEMBL11152562 0.82 ALDH1A1 (0.54) HTTTSHRSLC22A6MAPTALDH1A1
SCHEMBL28689978 0.82 ALDH1A1 (0.54) HTTTSHRSLC22A6MAPTALDH1A1
SCHEMBL6693971 0.82 HTT (0.53) HTTTSHRSLC22A6MAPTALDH1A1
SCHEMBL9035473 0.82 HTT (0.57) HTTTSHRSLC22A6MAPTALDH1A1
SCHEMBL6906339 0.82 CA12 (0.55) HTTTSHRMAPTALDH1A1HPGD
SCHEMBL28445125 0.82 GPR84 (0.46) HTTTSHRGPR84MAPTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023008507-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND SILICON-CONTAINING RESIST UNDERLAYER FILM 日産化学株式会社 2023-02-02 WO disclosed
CN-112441920-B Method for copper photocatalytic synthesis of 9-acetoxyl-9, 10-dihydrophenanthrene compound 浙江工业大学 2022-03-18 CN disclosed
CN-112441921-B Method for synthesizing 9-acetoxyl-9, 10-dihydrophenanthrene compound by virtue of iridium photocatalysis 浙江工业大学 2022-03-18 CN disclosed
CN-112441921-A Method for synthesizing 9-acetoxyl-9, 10-dihydrophenanthrene compound by virtue of iridium photocatalysis 浙江工业大学 2021-03-05 CN disclosed
CN-112441920-A Method for copper photocatalytic synthesis of 9-acetoxyl-9, 10-dihydrophenanthrene compound 浙江工业大学 2021-03-05 CN disclosed
CN-110330420-B Process for preparing acids with different substituents 湖南大学 2020-07-10 CN disclosed