Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.41 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.41 |
| ▸ | ACR | P10323 | 1/20 | 0.41 |
| ▸ | TMPRSS15 | P98073 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 5/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | NSD2 | O96028 | 1/20 | 0.38 |
| ▸ | CA9 | Q16790 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | PKM | P14618 | 1/20 | 0.37 |
| ▸ | EGFR | P00533 | 1/20 | 0.36 |
| ▸ | NPY1R | P25929 | 1/20 | 0.36 |
| ▸ | NPY2R | P49146 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2497787 | 0.86 | EGFR (0.52) | MAPTALDH1A1SMN1; SMN2L3MBTL1PKM | |
| SCHEMBL2494165 | 0.85 | MAPT (0.42) | PARP10PRSS1ACRTMPRSS15MAPT | |
| SCHEMBL2495232 | 0.85 | PARP10 (0.41) | PARP10PRSS1ACRTMPRSS15MAPT | |
| SCHEMBL2497219 | 0.82 | PARP10 (0.40) | PARP10PRSS1ACRTMPRSS15MAPT | |
| SCHEMBL2496668 | 0.82 | PDK2 (0.50) | MAPTALDH1A1KMT2AMEN1SMN1; SMN2 | |
| SCHEMBL8667367 | 0.82 | KMT2A (0.46) | PARP10PRSS1ACRTMPRSS15MAPT | |
| SCHEMBL2492052 | 0.82 | MAPT (0.41) | PARP10PRSS1ACRTMPRSS15MAPT | |
| SCHEMBL8664019 | 0.81 | MAPT (0.40) | PARP10PRSS1ACRTMPRSS15MAPT | |
| SCHEMBL8665764 | 0.81 | MYC (0.47) | PARP10PRSS1ACRTMPRSS15MAPT | |
| SCHEMBL8665932 | 0.78 | IDO1 (0.37) | MAPTTDP1ALDH1A1KMT2ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10113907-B2 | Ultraviolet-sensing sheet, ultraviolet-sensing set, and ultraviolet-sensing method | FUJIFILM CORPORATION (JP) | 2018-10-30 | — | — | US | disclosed |
| US-20170131144-A1 | ULTRAVIOLET-SENSING SHEET, ULTRAVIOLET-SENSING SET, AND ULTRAVIOLET-SENSING METHOD | FUJIFILM CORPORATION (JP) | 2017-05-11 | — | — | US | disclosed |
| US-9068082-B2 | Colored curable composition and color filter | FUJIFILM CORPORATION (JP) | 2015-06-30 | — | — | US | disclosed |
| US-20150108086-A1 | COLORED CURABLE COMPOSITION AND COLOR FILTER | FUJIFILM CORPORATION (JP) | 2015-04-23 | — | — | US | disclosed |
| US-8029877-B2 | Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-20100238388-A1 | CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-09-23 | — | — | US | disclosed |
| US-7758930-B2 | Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2010-07-20 | — | — | US | disclosed |
| US-20090202749-A1 | CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL | HAYASHI SHINJI | 2009-08-13 | — | — | US | disclosed |
| US-7537810-B2 | Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-05-26 | — | — | US | disclosed |
| US-20060229376-A1 | Curable resin composition, photosensitive pattern-forming curable resin composition,color filter, substrate for liquid crystalline panel, and liquid crystalline panel | DAI NIPPON PRINTING CO., LTD. (JP) | 2006-10-12 | — | — | US | disclosed |
| US-5866298-A | Radiation sensitive composition for color filters | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1999-02-02 | — | — | US | disclosed |
| US-5792589-A | ORGANIC BINDER; OPTICALLY CROSSLINKABLE COMPOUND; RADICAL-GENERATING AGENT: 2,4,5-TRIARYL IMIDAZOLE DIMER, AMINO-GROUP CONTAINING BENZOPHENONE PHOTOSENSITIZER, A THIOL COMPOUND | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-08-11 | — | — | US | disclosed |
| EP-0775941-A1 | Radiation sensitive composition for color filters | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-28 | — | — | EP | disclosed |