SCHEMBL2492052

SCHEMBL2492052

CCc1ccccc1C1(C2(c3ccccc3CC)N=C(c3ccc(C(=O)Oc4ccccc4)cc3)C(c3ccc(C(=O)Oc4ccccc4)cc3)=N2)N=C(c2ccc(C(=O)Oc3ccccc3)cc2)C(c2ccc(C(=O)Oc3ccccc3)cc2)=N1

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MAPT P10636 8/20 0.41
TDP1 Q9NUW8 2/20 0.41
SMN1; SMN2 Q16637 1/20 0.40
TP53 P04637 1/20 0.40
PARP10 Q53GL7 1/20 0.40
TMPRSS15 P98073 2/20 0.39
PRSS1 P07477 1/20 0.39
ACR P10323 1/20 0.39
ALDH1A1 P00352 4/20 0.39
CCNC P24863 1/20 0.38
CDK8 P49336 1/20 0.38
KMT2A Q03164 5/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
PKM P14618 1/20 0.38
MEN1 O00255 2/20 0.38
SREBF2 Q12772 1/20 0.37
THRB P10828 1/20 0.37
HPGD P15428 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2492082 0.86 TSHR (0.42) MAPTTDP1SMN1; SMN2ALDH1A1L3MBTL1
SCHEMBL2494165 0.85 MAPT (0.42) MAPTTDP1SMN1; SMN2PARP10TMPRSS15
SCHEMBL8427318 0.85 PDK2 (0.46) MAPTSMN1; SMN2ALDH1A1KMT2AMEN1
SCHEMBL8667367 0.83 KMT2A (0.46) MAPTTDP1SMN1; SMN2PARP10TMPRSS15
SCHEMBL2495232 0.82 PARP10 (0.41) MAPTTDP1SMN1; SMN2PARP10TMPRSS15
SCHEMBL2496334 0.82 PARP10 (0.41) MAPTTDP1SMN1; SMN2PARP10TMPRSS15
SCHEMBL2497219 0.81 PARP10 (0.40) MAPTTDP1SMN1; SMN2PARP10TMPRSS15
SCHEMBL149221 0.80 CYP2D6 (0.41) MAPTSMN1; SMN2TP53ALDH1A1HPGD
SCHEMBL8665764 0.79 MYC (0.47) MAPTSMN1; SMN2PARP10TMPRSS15PRSS1
SCHEMBL8665435 0.78 MAPT (0.42) MAPTTDP1SMN1; SMN2ALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10113907-B2 Ultraviolet-sensing sheet, ultraviolet-sensing set, and ultraviolet-sensing method FUJIFILM CORPORATION (JP) 2018-10-30 US disclosed
US-20170131144-A1 ULTRAVIOLET-SENSING SHEET, ULTRAVIOLET-SENSING SET, AND ULTRAVIOLET-SENSING METHOD FUJIFILM CORPORATION (JP) 2017-05-11 US disclosed
US-9068082-B2 Colored curable composition and color filter FUJIFILM CORPORATION (JP) 2015-06-30 US disclosed
US-20150108086-A1 COLORED CURABLE COMPOSITION AND COLOR FILTER FUJIFILM CORPORATION (JP) 2015-04-23 US disclosed
US-8029877-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2011-10-04 US disclosed
US-20100238388-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2010-09-23 US disclosed
US-7758930-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2010-07-20 US disclosed
US-20090202749-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL HAYASHI SHINJI 2009-08-13 US disclosed
US-7537810-B2 Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2009-05-26 US disclosed
US-20060229376-A1 Curable resin composition, photosensitive pattern-forming curable resin composition,color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2006-10-12 US disclosed
US-5866298-A Radiation sensitive composition for color filters JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1999-02-02 US disclosed
US-5792589-A ORGANIC BINDER; OPTICALLY CROSSLINKABLE COMPOUND; RADICAL-GENERATING AGENT: 2,4,5-TRIARYL IMIDAZOLE DIMER, AMINO-GROUP CONTAINING BENZOPHENONE PHOTOSENSITIZER, A THIOL COMPOUND JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-08-11 US disclosed
EP-0775941-A1 Radiation sensitive composition for color filters JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-05-28 EP disclosed