SCHEMBL24985035

SCHEMBL24985035

C=Cc1ccc(C(=O)OC2(Cc3ccccc3)CCCC2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CTSK P43235 6/20 0.44
CTSL P07711 4/20 0.44
CTSB P07858 3/20 0.44
CTSS P25774 1/20 0.37
KMT2A Q03164 3/20 0.36
MEN1 O00255 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2D6 P10635 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
LMNA P02545 1/20 0.35
SLC6A2 P23975 1/20 0.35
SLC6A3 Q01959 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
MAOA P21397 1/20 0.34
MAOB P27338 1/20 0.34
ADRB2 P07550 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4580949 0.88 CTSK (0.49) CTSKCTSLCTSBCTSSKMT2A
SCHEMBL4580951 0.84 CTSK (0.46) CTSKCTSLCTSBCTSSKMT2A
SCHEMBL9963791 0.81 TAS1R3 (0.40) KMT2AMEN1CYP1A2CYP3A4CYP2D6
SCHEMBL24948256 0.80 TAS1R3 (0.39) CTSKCTSLCTSBKMT2AMEN1
SCHEMBL4581480 0.79 CTSK (0.46) CTSKCTSLCTSBCTSSKMT2A
SCHEMBL24715987 0.77 TAS1R3 (0.38) KMT2AMEN1CYP1A2CYP3A4CYP2D6
SCHEMBL4580413 0.76 CTSK (0.49) CTSKCTSLCTSBCTSSCYP3A4
SCHEMBL24262285 0.76 TAS1R3 (0.38) KMT2AMEN1CYP1A2CYP3A4CYP2D6
SCHEMBL24985034 0.76 PARP15 (0.34) KMT2AMEN1SMN1; SMN2NPSR1LMNA
SCHEMBL4581483 0.75 CTSK (0.44) CTSKCTSLCTSBCYP2D6CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023008347-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2023-02-02 WO disclosed