SCHEMBL24948256

SCHEMBL24948256

C=Cc1ccc(C(=O)OC2(CC)CCCCC2)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAS1R3 Q7RTX0 2/20 0.39
TAS1R1 Q7RTX1 2/20 0.39
ALDH1A1 P00352 2/20 0.36
SMN1; SMN2 Q16637 4/20 0.35
NPSR1 Q6W5P4 4/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
GAA P10253 1/20 0.34
LMNA P02545 3/20 0.33
NPC1 O15118 2/20 0.33
RAB9A P51151 2/20 0.33
HTT P42858 2/20 0.33
TDP1 Q9NUW8 1/20 0.33
PIM1 P11309 1/20 0.33
SNCA P37840 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9963791 0.99 TAS1R3 (0.40) TAS1R3TAS1R1ALDH1A1SMN1; SMN2NPSR1
SCHEMBL7196430 0.88 SMN1; SMN2 (0.41) ALDH1A1SMN1; SMN2NPSR1MEN1KMT2A
SCHEMBL24306003 0.82 TDP1 (0.44) ALDH1A1SMN1; SMN2NPSR1MEN1KMT2A
SCHEMBL24985034 0.82 PARP15 (0.34) TAS1R3TAS1R1SMN1; SMN2NPSR1MEN1
SCHEMBL25561436 0.82 MCL1 (0.38) TAS1R3TAS1R1SMN1; SMN2NPSR1MEN1
SCHEMBL17247256 0.81 CYP19A1 (0.40) TAS1R3TAS1R1ALDH1A1SMN1; SMN2NPSR1
SCHEMBL25779631 0.81 SMN1; SMN2 (0.37) ALDH1A1SMN1; SMN2NPSR1MEN1KMT2A
SCHEMBL24305906 0.81 CA12 (0.39)
SCHEMBL9618428 0.81 LMNA (0.45) ALDH1A1SMN1; SMN2NPSR1MEN1KMT2A
SCHEMBL24305771 0.81 PTGS2 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11829068-B2 Resist composition, method of forming resist pattern, compound, and resin TOKYO OHKA KOGYO CO., LTD. (JP) 2023-11-28 US disclosed
US-11829068-B2 Resist composition, method of forming resist pattern, compound, and resin TOKYO OHKA KOGYO CO., LTD. (JP) 2023-11-28 US disclosed
WO-2023008346-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2023-02-02 WO disclosed