SCHEMBL25011920

SCHEMBL25011920

Cc1c(-c2ccccc2)cc(-c2ccccc2)c(N)c1C

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 5/20 0.43
ALDH1A1 P00352 4/20 0.43
PDE4A P27815 1/20 0.42
PDE4B Q07343 1/20 0.42
PDE4C Q08493 1/20 0.42
PDE4D Q08499 1/20 0.42
PDE3B Q13370 1/20 0.42
PDE3A Q14432 1/20 0.42
SQOR Q9Y6N5 1/20 0.42
PTGS1 P23219 1/20 0.40
SMARCA2 P51531 1/20 0.39
SMARCA4 P51532 1/20 0.39
PBRM1 Q86U86 1/20 0.39
ESR2 Q92731 1/20 0.39
BACE1 P56817 1/20 0.39
DPP4 P27487 1/20 0.39
KDM4E B2RXH2 3/20 0.39
HPGD P15428 3/20 0.39
PDCD1 Q15116 1/20 0.38
CD274 Q9NZQ7 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27838382 0.92 HSD17B10 (0.50) HSD17B10ALDH1A1PDE4APDE4BPDE4C
SCHEMBL27544380 0.85 ESR2 (0.42) HSD17B10ALDH1A1PDE4APDE4BPDE4C
SCHEMBL28754177 0.85 PDE4A (0.44) HSD17B10ALDH1A1PDE4APDE4BPDE4C
SCHEMBL11836320 0.85 PDE4A (0.49) HSD17B10ALDH1A1PDE4APDE4BPDE4C
Hydrochloric Acid SCHEMBL28477097 0.83 PDE4A (0.43) HSD17B10ALDH1A1PDE4APDE4BPDE4C
Hydrochloric Acid SCHEMBL11680716 0.83 PDE4A (0.47) HSD17B10ALDH1A1PDE4APDE4BPDE4C
SCHEMBL2852708 0.81 PDE4A (0.44) HSD17B10ALDH1A1PDE4APDE4BPDE4C
SCHEMBL9329605 0.79 KMT2A (0.41) HSD17B10ALDH1A1PDE4APDE4BPDE4C
SCHEMBL24254917 0.79 ALDH1A1 (0.52) HSD17B10ALDH1A1SMARCA2SMARCA4PBRM1
SCHEMBL9854765 0.78 PDE4A (0.50) HSD17B10ALDH1A1PDE4APDE4BPDE4C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023013697-A1 MATERIAL FOR METAL PATTERNING, FLUORO COMPOUND, THIN FILM FOR METAL PATTERNING, ORGANIC ELECTROLUMINESCENCE DEVICE, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2023-02-09 WO disclosed