SCHEMBL25012015

SCHEMBL25012015

FC(F)(c1nc(Cl)c(Cl)c(Cl)n1)C(F)(F)C(F)(F)C(F)(F)c1nc(Cl)c(Cl)c(Cl)n1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2116132 0.78 — —
SCHEMBL25011787 0.72 — —
SCHEMBL2118504 0.69 — —
SCHEMBL376361 0.67 CYP1A2 (0.31) —
SCHEMBL4300065 0.67 LMNA (0.36) —
SCHEMBL6476727 0.67 LMNA (0.36) —
SCHEMBL17413752 0.67 ALDH1A1 (0.33) —
SCHEMBL8504406 0.65 ELANE (0.31) —
SCHEMBL25012746 0.65 — —
SCHEMBL6401815 0.64 PDE4A (0.33) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023013697-A1 MATERIAL FOR METAL PATTERNING, FLUORO COMPOUND, THIN FILM FOR METAL PATTERNING, ORGANIC ELECTROLUMINESCENCE DEVICE, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2023-02-09 — — WO disclosed
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