SCHEMBL2502424

SCHEMBL2502424

CN(C)c1ccc(C=CC=C2CCC(=CC=Cc3ccc(N(C)C)cc3)C2=O)cc1

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TXNRD1 Q16881 1/20 0.65
▸ CYP1A2 P05177 1/20 0.57
▸ APP P05067 6/20 0.56
▸ ABCB1 P08183 1/20 0.55
▸ METAP1 P53582 2/20 0.55
▸ MAPT P10636 5/20 0.54
▸ MEN1 O00255 2/20 0.54
▸ LMNA P02545 2/20 0.54
▸ KMT2A Q03164 2/20 0.54
▸ NPC1 O15118 2/20 0.54
▸ RAB9A P51151 2/20 0.54
▸ SMN1; SMN2 Q16637 2/20 0.54
▸ MAPK1 P28482 1/20 0.54
▸ MCOLN3 Q8TDD5 1/20 0.54
▸ L3MBTL1 Q9Y468 1/20 0.54
▸ NSD2 O96028 1/20 0.53
▸ ALDH1A1 P00352 1/20 0.51
▸ DNMT1 P26358 1/20 0.50
▸ SNCA P37840 2/20 0.48
▸ HPGD P15428 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5428973 0.94 CYP1A2 (0.67) TXNRD1CYP1A2APPABCB1METAP1
SCHEMBL10021996 0.83 MAPT (0.63) TXNRD1CYP1A2APPABCB1METAP1
SCHEMBL14089329 0.82 TXNRD1 (0.47) TXNRD1CYP1A2APPABCB1METAP1
SCHEMBL13707088 0.82 TXNRD1 (0.47) TXNRD1CYP1A2APPABCB1METAP1
SCHEMBL14089344 0.81 DNMT1 (0.46) TXNRD1CYP1A2APPABCB1METAP1
SCHEMBL6230752 0.81 TXNRD1 (0.55) TXNRD1CYP1A2APPABCB1METAP1
SCHEMBL2868624 0.79 CYP1A2 (0.86) CYP1A2APPABCB1MAPTMEN1
SCHEMBL29099913 0.79 CYP1A2 (0.86) CYP1A2APPABCB1MAPTMEN1
SCHEMBL2869244 0.79 CYP1A2 (0.86) CYP1A2APPABCB1MAPTMEN1
SCHEMBL11966165 0.79 CYP1A2 (0.86) CYP1A2APPABCB1MAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12488909-B2 Oxygen and moisture barrier compositions and related methods UNIVERSITY OF MASSACHUSETTS (US) 2025-12-02 — — US disclosed
US-20240242854-A1 OXYGEN AND MOISTURE BARRIER COMPOSITIONS AND RELATED METHODS US GOVERNMENT AS REPRESENTED BY THE SECRETARY OF THE ARMY 2024-07-18 — — US disclosed
US-9946158-B2 Composition for forming resist underlayer film for nanoimprint NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-04-17 — — US disclosed
EP-2461350-B1 USE OF A COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT LITHOGRAPHY NISSAN CHEMICAL IND LTD (JP) 2018-02-28 — — EP disclosed
US-9134610-B2 Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-09-15 — — US disclosed
US-20150099070-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT NISSAN CHEMICAL IND LTD (JP) 2015-04-09 — — US disclosed
EP-1852134-B1 ORTHOPEDIC PHOTO-CURABLE FIXING MATERIAL ALCARE CO LTD (JP) 2015-04-01 — — EP disclosed
US-20130189850-A1 RESIST UNDERLAYER COATING FORMING COMPOSITION FOR FORMING PHOTO-CROSSLINKING CURED RESIST UNDERLAYER COATING NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2013-07-25 — — US disclosed
US-8426111-B2 Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2013-04-23 — — US disclosed
EP-2461350-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT LITHOGRAPHY Nissan Chemical Industries, Ltd. (JP) 2012-06-06 — — EP disclosed
US-20080045622-A1 Photocurable Fixture for Orthopedic Surgery ALCARE CO., LTD. (JP) 2008-02-21 — — US disclosed
EP-1879070-A1 COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION FOR FORMING PHOTOCROSSLINKING CURED RESIST UNDERLAYER FILM Nissan Chemical Industries, Ltd. (JP) 2008-01-16 — — EP disclosed
US-20070292803-A1 Optical recording medium and recording method thereof KABUSHIKI KAISHA TOSHIBA (JP) 2007-12-20 — — US disclosed
EP-1865502-A2 Optical recording medium and recording method thereof Kabushiki Kaisha Toshiba (JP) 2007-12-12 — — EP disclosed
EP-1860504-A1 PHOTOSENSITIVE COMPOSITION CONTAINING ORGANIC FINE PARTICLES National University Corporation The University of Electro - Communications (JP) 2007-11-28 — — EP disclosed
EP-1852134-A1 ORTHOPEDIC PHOTO-CURABLE FIXING MATERIAL Alcare Co., Ltd. (JP) 2007-11-07 — — EP disclosed
US-20070148556-A1 Photosensitive composition for volume hologram recording DAI NIPPON PRINTING CO., LTD. (JP) 2007-06-28 — — US disclosed
US-5284735-A Mixture of radical-polymerizable compound having two or more double bonds, photoinitiator, high molecular weight organic compound and di-substituted ethylene compound OKAMOTO CHEMICAL INDUSTRY CO., LTD. (JP) 1994-02-08 — — US disclosed
US-4987056-A IMPROVED SENSITIVITY TO VISIBLE LIGHT TOYO BOSEKI KABUSHIKI KAISHA (JP) 1991-01-22 — — US disclosed
US-4264710-A AN ETHYLENICALLY UNSATURATED COMPOUND, AND A PHOTOPOLYMERIZATION INIATOR FUJI PHOTO FILM CO., LTD. (JP) 1981-04-28 — — US disclosed
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