Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 3/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22401727 | 1.00 | DNM1 (0.36) | DNM1TSHRTHRBKCNH2 | |
| SCHEMBL1204219 | 1.00 | DNM1 (0.36) | DNM1TSHRTHRBKCNH2 | |
| SCHEMBL328755 | 0.91 | — | — | |
| Octane SCHEMBL27556408 | 0.77 | DNM1 (0.42) | DNM1TSHRTHRB | |
| Hexane SCHEMBL4630266 | 0.77 | DNM1 (0.36) | DNM1TSHRTHRB | |
| SCHEMBL8319455 | 0.75 | DNM1 (0.40) | DNM1TSHRTHRBKCNH2 | |
| SCHEMBL8178948 | 0.75 | DNM1 (0.40) | DNM1TSHRTHRBKCNH2 | |
| SCHEMBL8193626 | 0.75 | DNM1 (0.40) | DNM1TSHRTHRBKCNH2 | |
| SCHEMBL29163071 | 0.74 | LMNA (0.46) | — | |
| SCHEMBL8319015 | 0.73 | DNM1 (0.39) | DNM1TSHRTHRBKCNH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9293417-B2 | Method for forming barrier film on wiring line | TOKYO ELECTRON LIMITED (JP) | 2016-03-22 | — | — | US | claimed |
| US-8709541-B2 | Method for forming a film | TOKYO ELECTRON LIMITED (JP) | 2014-04-29 | — | — | US | claimed |
| US-20120251721-A1 | DEVICE AND METHOD FOR FORMING FILM | TOKYO ELECTRON LIMITED (JP) | 2012-10-04 | — | — | US | claimed |
| US-20120114869-A1 | FILM FORMING METHOD | TOKYO ELECTRON LIMITED (JP) | 2012-05-10 | — | — | US | claimed |
| US-7129187-B2 | Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films | TOKYO ELECTRON LIMITED (JP) | 2006-10-31 | — | — | US | claimed |
| WO-2006019438-A2 | LOW-TEMPERATURE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF SILICON-NITROGEN-CONTAINING FILMS | TOKYO ELECTRON LIMITED (JP) | 2006-02-23 | — | — | WO | claimed |
| US-20060014399-A1 | Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films | TOKYO ELECTRON LIMITED | 2006-01-19 | — | — | US | claimed |
| US-20250066621-A1 | COMPOSITION FOR FILM FORMATION AND METHOD FOR MANUFACTURING SUBSTRATE | CENTRAL GLASS COMPANY, LIMITED (JP) | 2025-02-27 | — | — | US | disclosed |
| WO-2024248021-A1 | FILM-FORMING COMPOSITION, METHOD FOR PRODUCING SUBSTRATE, AND METHOD FOR PRODUCING FILM-FORMING COMPOSITION | セントラル硝子株式会社 | 2024-12-05 | — | — | WO | disclosed |
| EP-4459666-A1 | COMPOSITION FOR FILM FORMATION AND METHOD FOR PRODUCING SUBSTRATE | Central Glass Company, Limited (JP) | 2024-11-06 | — | — | EP | disclosed |
| CN-118451534-A | Film-forming composition and method for producing substrate | 中央硝子株式会社 | 2024-08-06 | — | — | CN | disclosed |
| WO-2024143097-A1 | SUBSTRATE TREATING METHOD AND SUBSTRATE MANUFACTURING METHOD | セントラル硝子株式会社 | 2024-07-04 | — | — | WO | disclosed |
| EP-3743464-B1 | ORGANIC-INORGANIC AEROGEL COMPOSITES, METHODS AND USES THEREOF | BRONX CREATIVE&DESIGN CENTRE PTE LTD (SG) | 2024-03-06 | — | — | EP | disclosed |
| EP-1320884-A2 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREFOR | TOKYO ELECTRON LIMITED (JP) | 2003-06-25 | — | — | EP | disclosed |
| WO-2002023625-A2 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREFOR | TOKYO ELECTRON LIMITED (JP) | 2002-03-21 | — | — | WO | disclosed |
| EP-0535947-B1 | Inorganic acid catalyzed silylation reactions | DOW CORNING (US) | 2000-05-03 | — | — | EP | disclosed |
| US-5824442-A | CONTROLLING DEVELOPMENT AND DEVELOPMENT FOR ELECTROSTATIC IMAGES WITH THIN FILMS | CANON KABUSHIKI KAISHA (JP) | 1998-10-20 | — | — | US | disclosed |
| US-5707770-A | TITANIA OR ALUMINA PARTICLES SURFACE TREATED WITH A SILICON COMPOUND OR SILICONE OIL, IMPROVED PERFORMANCE IN HIGH HUMIDITY | CANON KABUSHIKI KAISHA (JP) | 1998-01-13 | — | — | US | disclosed |
| US-5157139-A | Inorganic acid catalysed silylation reactions | DOW CORNING CORPORATION (US) | 1992-10-20 | — | — | US | disclosed |
| US-4333564-A | Method of controlling rheological properties of gel-like compositions | SHERWOOD MEDICAL INDUSTRIES INC. (US) | 1982-06-08 | — | — | US | disclosed |