⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1204219 | 0.91 | DNM1 (0.36) | — | |
| SCHEMBL22401727 | 0.91 | DNM1 (0.36) | — | |
| SCHEMBL2507692 | 0.91 | DNM1 (0.36) | — | |
| SCHEMBL2503494 | 0.85 | — | — | |
| SCHEMBL11586395 | 0.78 | — | — | |
| Hexane SCHEMBL4630266 | 0.75 | DNM1 (0.36) | — | |
| SCHEMBL2273385 | 0.74 | DNM1 (0.33) | — | |
| SCHEMBL131706 | 0.74 | — | — | |
| SCHEMBL18489987 | 0.72 | — | — | |
| Octane SCHEMBL27556408 | 0.71 | DNM1 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9293417-B2 | Method for forming barrier film on wiring line | TOKYO ELECTRON LIMITED (JP) | 2016-03-22 | — | — | US | claimed |
| US-8709541-B2 | Method for forming a film | TOKYO ELECTRON LIMITED (JP) | 2014-04-29 | — | — | US | claimed |
| US-20120251721-A1 | DEVICE AND METHOD FOR FORMING FILM | TOKYO ELECTRON LIMITED (JP) | 2012-10-04 | — | — | US | claimed |
| US-20120114869-A1 | FILM FORMING METHOD | TOKYO ELECTRON LIMITED (JP) | 2012-05-10 | — | — | US | claimed |
| US-7618913-B2 | Coordination catalyst containing an organosilicon compound , nitrogen compound, transition metal compound and magnesiumon compound on catalyst support | FORMOSA PLASTICS CORPORATION, U.S.A. (US) | 2009-11-17 | — | — | US | claimed |
| WO-2008027479-A2 | HIGHLY ACTIVE ALPHA-OLEFIN COPOLYMERIZATION CATALYST SYSTEM | FORMOSA PLASTICS CORPORATION, U.S.A. (US) | 2008-03-06 | — | — | WO | claimed |
| US-20080058198-A1 | Highly active alpha-olefin copolymerization catalyst system | FORMOSA PLASTICS CORPORATION, U.S.A. | 2008-03-06 | — | — | US | claimed |
| US-7129187-B2 | Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films | TOKYO ELECTRON LIMITED (JP) | 2006-10-31 | — | — | US | claimed |
| WO-2006019438-A2 | LOW-TEMPERATURE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF SILICON-NITROGEN-CONTAINING FILMS | TOKYO ELECTRON LIMITED (JP) | 2006-02-23 | — | — | WO | claimed |
| US-20060014399-A1 | Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films | TOKYO ELECTRON LIMITED | 2006-01-19 | — | — | US | claimed |
| US-20040035791-A1 | Formation of hydrophilic sites in partially silylated micelle templated silica | UNIVERSITE LAVAL (CA) | 2004-02-26 | — | — | US | claimed |
| WO-2002016267-A1 | FORMATION OF HYDROPHILIC SITES IN PARTIALLY SILYLATED MICELLE TEMPLATED SILICA | UNIVERSITE LAVAL (CA) | 2002-02-28 | — | — | WO | claimed |
| US-20250066621-A1 | COMPOSITION FOR FILM FORMATION AND METHOD FOR MANUFACTURING SUBSTRATE | CENTRAL GLASS COMPANY, LIMITED (JP) | 2025-02-27 | — | — | US | disclosed |
| WO-2024248021-A1 | FILM-FORMING COMPOSITION, METHOD FOR PRODUCING SUBSTRATE, AND METHOD FOR PRODUCING FILM-FORMING COMPOSITION | セントラル硝子株式会社 | 2024-12-05 | — | — | WO | disclosed |
| EP-4459666-A1 | COMPOSITION FOR FILM FORMATION AND METHOD FOR PRODUCING SUBSTRATE | Central Glass Company, Limited (JP) | 2024-11-06 | — | — | EP | disclosed |
| CN-118451534-A | Film-forming composition and method for producing substrate | 中央硝子株式会社 | 2024-08-06 | — | — | CN | disclosed |
| EP-1320884-A2 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREFOR | TOKYO ELECTRON LIMITED (JP) | 2003-06-25 | — | — | EP | disclosed |
| WO-2002023625-A2 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREFOR | TOKYO ELECTRON LIMITED (JP) | 2002-03-21 | — | — | WO | disclosed |
| WO-2002016267-A1 | FORMATION OF HYDROPHILIC SITES IN PARTIALLY SILYLATED MICELLE TEMPLATED SILICA | UNIVERSITE LAVAL (CA) | 2002-02-28 | — | — | WO | disclosed |
| US-5738976-A | HEAT RESISTANT, STORAGE STABLE POLYSILSESQUIOXANE MIXED WITH PHOTOSENSITIZER; PHOTORESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-04-14 | — | — | US | disclosed |