Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.34 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL39976 | 0.73 | CYP2C9 (0.42) | CYP2C9HSD11B1EPHX1 | |
| Lithium SCHEMBL5510213 | 0.71 | CYP2C9 (0.40) | CYP2C9HSD11B1EPHX1 | |
| SCHEMBL387735 | 0.69 | CYP2C9 (0.33) | CYP2C9HSD11B1 | |
| SCHEMBL412518 | 0.69 | CYP2C9 (0.33) | CYP2C9HSD11B1 | |
| SCHEMBL13577591 | 0.69 | CYP2C9 (0.38) | CYP2C9HSD11B1EPHX1 | |
| SCHEMBL3708629 | 0.69 | CYP2C9 (0.38) | CYP2C9HSD11B1EPHX1 | |
| SCHEMBL1238711 | 0.69 | CYP2C9 (0.38) | CYP2C9HSD11B1EPHX1 | |
| SCHEMBL10584202 | 0.69 | CYP2C9 (0.38) | CYP2C9HSD11B1EPHX1 | |
| SCHEMBL14219015 | 0.69 | CYP2C9 (0.45) | CYP2C9HSD11B1EPHX1 | |
| SCHEMBL6894994 | 0.68 | HSD11B1 (0.47) | CYP2C9HSD11B1EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8722321-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-13 | — | — | US | claimed |
| US-20120276485-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-01 | — | — | US | claimed |
| US-20120270159-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-25 | — | — | US | claimed |
| US-20080318156-A1 | Adamantane Based Molecular Glass Photoresists for Sub-200 Nm Lithography | CORNELL RESEARCH FOUNDATION, INC. | 2008-12-25 | — | — | US | claimed |
| EP-1991910-A1 | ADAMANTANE BASED MOLECULAR GLASS PHOTORESISTS FOR SUB-200 NM LITHOGRAPHY | Cornell Research Foundation, Inc. (US) | 2008-11-19 | — | — | EP | claimed |
| WO-2007094784-A1 | ADAMANTANE BASED MOLECULAR GLASS PHOTORESISTS FOR SUB-200 NM LITHOGRAPHY | CORNELL RESEARCH FOUNDATION, INC. (US) | 2007-08-23 | — | — | WO | claimed |
| US-20210018836-A1 | PHOTORESIST COMPOSITION FOR THICK FILM AND METHOD OF FORMING THICK FILM PHOTORESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-01-21 | — | — | US | disclosed |
| EP-2482132-B1 | Resist pattern forming process | SHINETSU CHEMICAL CO (JP) | 2019-10-16 | — | — | EP | disclosed |
| US-20170343897-A1 | CHEMICAL FOR PHOTOLITHOGRAPHY WITH IMPROVED LIQUID TRANSFER PROPERTY AND RESIST COMPOSITION COMPRISING THE SAME | TOKYO OHKA KOGYO CO LTD (JP) | 2017-11-30 | — | — | US | disclosed |
| US-20160306278-A1 | CHEMICAL FOR PHOTOLITHOGRAPHY WITH IMPROVED LIQUID TRANSFER PROPERTY AND RESIST COMPOSITION COMPRISING THE SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-10-20 | — | — | US | disclosed |
| US-9057949-B2 | Patterning process, resist composition, polymer, and polymerizable ester compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| US-8859187-B2 | Method of forming resist pattern and negative resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8835092-B2 | Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| US-20090029288-A1 | METHOD FOR PRODUCING RESIST COMPOSITION AND RESIST COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-01-29 | — | — | US | disclosed |
| US-20090023102-A1 | POSITIVE RESIST COMPOSITION FOR FORMING THICK-FILM RESIST, THICK-FILM RESIST LAMINATE, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD (JP) | 2009-01-22 | — | — | US | disclosed |
| US-20080102405-A1 | Nitrogen-containing organic compound, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-05-01 | — | — | US | disclosed |
| US-20080063974-A1 | Positive Resist Composition and Method for Forming Resist Pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-03-13 | — | — | US | disclosed |
| EP-1895576-A1 | PATTERN COATING MATERIAL AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-03-05 | — | — | EP | disclosed |
| US-20080008965-A1 | Ester compounds and their preparation, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-01-10 | — | — | US | disclosed |
| EP-1813990-A1 | METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-08-01 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080102405-A1 | Nitrogen-containing organic compound, resist composition and patterning process | MDM4, MUS81, NOP2 | CYP2C9 2755/4885HSD11B1 4388/4885EPHX1 1509/4885 |
| US-20080008965-A1 | Ester compounds and their preparation, polymers, resist compositions and patterning process | ESR1, H1-2, H1-4 | CYP2C9 1497/4885HSD11B1 1579/4885EPHX1 93/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.