Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | FDFT1 | P37268 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL92309 | 0.74 | FDFT1 (0.35) | CYP2C9FDFT1HSD11B1 | |
| SCHEMBL855901 | 0.74 | CYP2C9 (0.33) | CYP2C9FDFT1HSD11B1 | |
| SCHEMBL4806257 | 0.70 | FDFT1 (0.31) | FDFT1 | |
| SCHEMBL29226312 | 0.70 | FDFT1 (0.40) | CYP2C9FDFT1HSD11B1 | |
| SCHEMBL13697603 | 0.70 | FDFT1 (0.33) | CYP2C9FDFT1 | |
| SCHEMBL16566372 | 0.70 | FDFT1 (0.36) | CYP2C9FDFT1 | |
| SCHEMBL19798414 | 0.70 | FDFT1 (0.40) | CYP2C9FDFT1HSD11B1 | |
| SCHEMBL19798411 | 0.69 | FDFT1 (0.39) | CYP2C9FDFT1HSD11B1 | |
| SCHEMBL251015 | 0.69 | CYP2C9 (0.38) | CYP2C9HSD11B1 | |
| SCHEMBL19798422 | 0.69 | FDFT1 (0.39) | FDFT1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8859187-B2 | Method of forming resist pattern and negative resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| EP-1895576-B1 | PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO LTD (JP) | 2014-07-23 | — | — | EP | disclosed |
| US-8349543-B2 | Pattern-forming method, metal oxide film-forming material and method for using the metal oxide film-forming material | TOKYO OHKA KOGYO CO. LTD. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-8124312-B2 | Method for forming pattern, and material for forming coating film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-02-28 | — | — | US | disclosed |
| US-8101013-B2 | Film-forming material and method of forming pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-24 | — | — | US | disclosed |
| US-8043795-B2 | Method of forming resist pattern | TOKYO OHIKA KOGYO CO., LTD. (JP) | 2011-10-25 | — | — | US | disclosed |
| US-8025923-B2 | Method for manufacturing a structure | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-09-27 | — | — | US | disclosed |
| US-7932013-B2 | Pattern coating material and pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-26 | — | — | US | disclosed |
| US-20100234316-A1 | Nucleoside Aryl Phosphoramidates for the Treatment of RNA-Dependent RNA Viral Infection | MSD ITALIA S.R.L. (IT) | 2010-09-16 | — | — | US | disclosed |
| US-20100062379-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-03-11 | — | — | US | disclosed |
| US-7638258-B2 | Positive resist composition and method for resist pattern formation | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090286936-A1 | COMPOSITION FOR FORMATION OF MOLD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |
| US-20090269706-A1 | METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-29 | — | — | US | disclosed |
| US-20090191478-A1 | METHOD OF FORMING RESIST PATTERN AND NEGATIVE RESIST COMPOSITION | TOKYO OHKA KOGYO CO., LTD (JP) | 2009-07-30 | — | — | US | disclosed |
| US-20090134119-A1 | FILM-FORMING MATERIAL AND METHOD OF FORMING PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-05-28 | — | — | US | disclosed |
| US-20090087625-A1 | METHOD FOR MANUFACTURING STRUCTURE, AND STRUCTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090061170-A1 | ANISOTROPIC FILM AND METHOD OF MANUFACTURING ANISOTROPIC FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20090042129-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-12 | — | — | US | disclosed |
| US-20090029284-A1 | PATTERN COATING MATERIAL AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-01-29 | — | — | US | disclosed |
| EP-1895576-A1 | PATTERN COATING MATERIAL AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-03-05 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100234316-A1 | Nucleoside Aryl Phosphoramidates for the Treatment of RNA-Dependent RNA Viral Infection | NSUN2, NSUN3, RNGTT | CYP2C9 1330/4885FDFT1 653/4885HSD11B1 3274/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.