Methacrylic Acid

Methacrylic Acid

SCHEMBL251193

C=C(C)C(=O)O.O=c1[nH]c(=O)[nH]c(=O)[nH]1

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TYMP P19971 2/20 0.41
ALDH1A1 P00352 3/20 0.39
LMNA P02545 2/20 0.39
TDP1 Q9NUW8 2/20 0.36
ALOX15 P16050 1/20 0.33
NFKB1 P19838 1/20 0.33
BLM P54132 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
JAK2 O60674 1/20 0.33
THRB P10828 1/20 0.33
NPC1 O15118 1/20 0.32
FFAR3 O14843 1/20 0.32
LCK P06239 1/20 0.32
FYN P06241 1/20 0.32
NSD2 O96028 1/20 0.31
ABL1 P00519 1/20 0.31
GAA P10253 1/20 0.31
IDE P14735 1/20 0.31
RIN1 Q13671 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL634441 1.00 TYMP (0.41) TYMPALDH1A1LMNATDP1ALOX15
Methacrylic Acid SCHEMBL546828 1.00 TYMP (0.41) TYMPALDH1A1LMNATDP1ALOX15
Methacrylic Acid SCHEMBL28176458 0.91 TDP1 (0.55) TYMPALDH1A1LMNATDP1ALOX15
Acetic Acid SCHEMBL31098135 0.82 FFAR3 (0.50) TYMPALDH1A1LMNATDP1ALOX15
SCHEMBL28129600 0.81 TDP1 (0.63) TYMPALDH1A1LMNATDP1ALOX15
Methacrylic Acid SCHEMBL15043 0.78 TDP1 (0.53) ALDH1A1LMNATDP1ALOX15BLM
Methacrylic Acid SCHEMBL11235035 0.78 TDP1 (0.53) ALDH1A1LMNATDP1ALOX15BLM
Methacrylic Acid SCHEMBL66252 0.78 TDP1 (0.53) ALDH1A1LMNATDP1ALOX15BLM
Methacrylic Acid SCHEMBL491341 0.78 TDP1 (0.53) ALDH1A1LMNATDP1ALOX15BLM
Methacrylic Acid SCHEMBL13234423 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1603 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024126332-A1 SACRIFICIAL ADDITIVELY MANUFACTURED MOLD WITH CONTROLLED MOISTURE AND LIQUID ABSORPTION PROPERTIES NEXA3D APS (DK) 2024-06-20 WO claimed
US-11899364-B2 Photosensitive polyimide compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2024-02-13 US claimed
US-11782344-B2 Photosensitive polyimide compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2023-10-10 US claimed
EP-3398202-B1 PHOTOSENSITIVE STACKED STRUCTURE FUJIFILM ELECTRONIC MAT USA INC (US) 2023-08-09 EP claimed
EP-3286605-B1 PHOTOSENSITIVE POLYIMIDE COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2023-06-28 EP claimed
US-11548964-B2 One-part curable soft feel coatings ARKEMA FRANCE (FR) 2023-01-10 US claimed
EP-3286606-B1 PHOTOSENSITIVE POLYIMIDE COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2022-12-28 EP claimed
US-20220173479-A1 Polyolefin Separator and Method for Manufacturing the Same LG CHEM, LTD. (KR) 2022-06-02 US claimed
EP-3937275-A1 POLYOLEFIN SEPARATOR AND METHOD FOR PRODUCING SAME LG CHEM, LTD. (KR) 2022-01-12 EP claimed
US-11175582-B2 Photosensitive stacked structure FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2021-11-16 US claimed
US-20060178448-A1 Halogen-free dry film photosensitive resin composition ETERNAL CHEMICAL CO., LTD. 2006-08-10 US claimed
WO-2006065660-A2 METAL-CONTAINING COMPOSITIONS HYBRID PLASTICS, INC. (US) 2006-06-22 WO claimed
US-20050142362-A1 Hard coat film LINTEC CORPORATION (JP) 2005-06-30 US claimed
US-6812276-B2 CURABLE MIXTURE OF A FUNCTIONALIZED POLY(ARYLENE ETHER) SUCH AS METHACRYLATE-ENDCAPPED POLY(2,6-DIMETHYLPHENYL ETHER), AN ALKENYL AROMATIC MONOMER, AND AN ALKOXYLATED ACRYLOYL MONOMER; GOOD STIFFNESS, TOUGHNESS, AND HEAT RESISTANCE GENERAL ELECTRIC COMPANY 2004-11-02 US claimed
EP-1378534-A1 Poly(arylene ether)-containing thermoset composition GENERAL ELECTRIC COMPANY (US) 2004-01-07 EP claimed
US-20030096123-A1 Curable mixture of a functionalized poly(arylene ether) such as methacrylate-endcapped poly(2,6-dimethylphenyl ether), an alkenyl aromatic monomer, and an alkoxylated acryloyl monomer; good stiffness, toughness, and heat resistance GENERAL ELECTRIC COMPANY 2003-05-22 US claimed
US-5998013-A CURED PRODUCT OF AN ULTRAVIOLET-CURING RESIN AND AGGLOMERATES OF COLLOIDAL SILICA PARTICLES FORMED WITH AN AMINE LINTEC CORPORATION (JP) 1999-12-07 US claimed
EP-0227394-B1 COATED ABRASIVE SUITABLE FOR USE AS A LAPPING MATERIAL MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1991-05-02 EP claimed
US-4773920-A CURABLE COATINGS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1988-09-27 US claimed
EP-0227394-A2 Coated abrasive suitable for use as a lapping material MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1987-07-01 EP claimed