Methacrylic Acid

Methacrylic Acid

SCHEMBL634441

C=C(C)C(=O)O.C=C(C)C(=O)O.C=C(C)C(=O)O.O=c1[nH]c(=O)[nH]c(=O)[nH]1

nearest known ligand 0.41

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TYMP P19971 2/20 0.41
ALDH1A1 P00352 3/20 0.39
LMNA P02545 2/20 0.39
TDP1 Q9NUW8 2/20 0.36
ALOX15 P16050 1/20 0.33
NFKB1 P19838 1/20 0.33
BLM P54132 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
JAK2 O60674 1/20 0.33
THRB P10828 1/20 0.33
NPC1 O15118 1/20 0.32
FFAR3 O14843 1/20 0.32
LCK P06239 1/20 0.32
FYN P06241 1/20 0.32
NSD2 O96028 1/20 0.31
ABL1 P00519 1/20 0.31
GAA P10253 1/20 0.31
IDE P14735 1/20 0.31
RIN1 Q13671 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL251193 1.00 TYMP (0.41) TYMPALDH1A1LMNATDP1ALOX15
Methacrylic Acid SCHEMBL546828 1.00 TYMP (0.41) TYMPALDH1A1LMNATDP1ALOX15
Methacrylic Acid SCHEMBL28176458 0.91 TDP1 (0.55) TYMPALDH1A1LMNATDP1ALOX15
Acetic Acid SCHEMBL31098135 0.82 FFAR3 (0.50) TYMPALDH1A1LMNATDP1ALOX15
SCHEMBL28129600 0.81 TDP1 (0.63) TYMPALDH1A1LMNATDP1ALOX15
Methacrylic Acid SCHEMBL15043 0.78 TDP1 (0.53) ALDH1A1LMNATDP1ALOX15BLM
Methacrylic Acid SCHEMBL11235035 0.78 TDP1 (0.53) ALDH1A1LMNATDP1ALOX15BLM
Methacrylic Acid SCHEMBL66252 0.78 TDP1 (0.53) ALDH1A1LMNATDP1ALOX15BLM
Methacrylic Acid SCHEMBL491341 0.78 TDP1 (0.53) ALDH1A1LMNATDP1ALOX15BLM
Methacrylic Acid SCHEMBL13234423 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 129 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3798243-B1 MODIFIED CONJUGATED DIENE-BASED POLYMER AND METHOD FOR PREPARING SAME LG CHEMICAL LTD (KR) 2023-11-01 EP claimed
CN-112292410-B Modified conjugated diene polymer and process for producing the same 株式会社LG化学 2023-09-19 CN claimed
US-11702497-B2 Modified conjugated diene-based polymer and method for preparing same LG CHEM, LTD. 2023-07-18 US claimed
US-20210253767-A1 Modified Conjugated Diene-Based Polymer and Method for Preparing Same LG CHEM, LTD. (KR) 2021-08-19 US claimed
EP-3798243-A1 MODIFIED CONJUGATED DIENE-BASED POLYMER AND PREPARATION METHOD THEREFOR LG CHEM, LTD. (KR) 2021-03-31 EP claimed
CN-112292410-A Modified conjugated diene polymer and preparation method thereof 株式会社LG化学 2021-01-29 CN claimed
WO-2020130738-A1 MODIFIED CONJUGATED DIENE-BASED POLYMER AND PREPARATION METHOD THEREFOR 주식회사 엘지화학 2020-06-25 WO claimed
EP-2420393-B1 PNEUMATIC TIRE BRIDGESTONE CORP (JP) 2014-01-29 EP claimed
US-20120048441-A1 PNEUMATIC TIRE BRIDGESTONE CORPORATION (JP) 2012-03-01 US claimed
EP-2420393-A1 PNEUMATIC TIRE Bridgestone Corporation (JP) 2012-02-22 EP claimed
EP-1015505-A1 PRODUCTION OF PHOTOPOLYMERIZED POLYESTER HIGH INDEX OPHTHALMIC LENSES SIGNET ARMORLITE, INC. (US) 2000-07-05 EP claimed
WO-1999011682-A1 PRODUCTION OF PHOTOPOLYMERIZED POLYESTER HIGH INDEX OPHTHALMIC LENSES SIGNET ARMORLITE, INC. (US) 1999-03-11 WO claimed
US-5852112-A Polyester resin-based high index ophthalmic lenses having improved optical unformity and/or tintability SIGNET ARMORLITE, INC. (US) 1998-12-22 US claimed
EP-0783710-A1 POLYESTER RESIN-BASED HIGH INDEX OPHTHALMIC LENSES HAVING IMPROVED OPTICAL UNIFORMITY AND/OR TINTABILITY SIGNET ARMORLITE, INC. (US) 1997-07-16 EP claimed
WO-1996010760-A1 POLYESTER RESIN-BASED HIGH INDEX OPHTHALMIC LENSES HAVING IMPROVED OPTICAL UNIFORMITY AND/OR TINTABILITY SIGNET ARMORLITE, INC. (US) 1996-04-11 WO claimed
WO-2024111129-A1 METHOD FOR PRODUCING POLYIMIDE PRECURSOR, POLYIMIDE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING PATTERN CURED PRODUCT, AND ELECTRONIC COMPONENT HDマイクロシステムズ株式会社 2024-05-30 WO disclosed
US-20240150549-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, TRANSPARENT ANTENNA AND MANUFACTURING METHOD THEREFOR, AND IMAGE DISPLAY DEVICE RESONAC CORPORATION (JP) 2024-05-09 US disclosed
EP-0353030-A2 Photopolymerization initiator and photosensitive composition employing the same CANON KABUSHIKI KAISHA (JP) 1990-01-31 EP disclosed
EP-0332455-A2 Photosensitive material and image forming method CANON KABUSHIKI KAISHA (JP) 1989-09-13 EP disclosed
EP-0297583-A2 Photosensitive material and image forming method by use thereof CANON KABUSHIKI KAISHA (JP) 1989-01-04 EP disclosed