Methacrylic Acid

Methacrylic Acid

SCHEMBL546828

C=C(C)C(=O)O.C=C(C)C(=O)O.O=c1[nH]c(=O)[nH]c(=O)[nH]1

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TYMP P19971 2/20 0.41
ALDH1A1 P00352 3/20 0.39
LMNA P02545 2/20 0.39
TDP1 Q9NUW8 2/20 0.36
ALOX15 P16050 1/20 0.33
NFKB1 P19838 1/20 0.33
BLM P54132 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
JAK2 O60674 1/20 0.33
THRB P10828 1/20 0.33
NPC1 O15118 1/20 0.32
FFAR3 O14843 1/20 0.32
LCK P06239 1/20 0.32
FYN P06241 1/20 0.32
NSD2 O96028 1/20 0.31
ABL1 P00519 1/20 0.31
GAA P10253 1/20 0.31
IDE P14735 1/20 0.31
RIN1 Q13671 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL251193 1.00 TYMP (0.41) TYMPALDH1A1LMNATDP1ALOX15
Methacrylic Acid SCHEMBL634441 1.00 TYMP (0.41) TYMPALDH1A1LMNATDP1ALOX15
Methacrylic Acid SCHEMBL28176458 0.91 TDP1 (0.55) TYMPALDH1A1LMNATDP1ALOX15
Acetic Acid SCHEMBL31098135 0.82 FFAR3 (0.50) TYMPALDH1A1LMNATDP1ALOX15
SCHEMBL28129600 0.81 TDP1 (0.63) TYMPALDH1A1LMNATDP1ALOX15
Methacrylic Acid SCHEMBL15043 0.78 TDP1 (0.53) ALDH1A1LMNATDP1ALOX15BLM
Methacrylic Acid SCHEMBL11235035 0.78 TDP1 (0.53) ALDH1A1LMNATDP1ALOX15BLM
Methacrylic Acid SCHEMBL66252 0.78 TDP1 (0.53) ALDH1A1LMNATDP1ALOX15BLM
Methacrylic Acid SCHEMBL491341 0.78 TDP1 (0.53) ALDH1A1LMNATDP1ALOX15BLM
Methacrylic Acid SCHEMBL13234423 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9029433-B2 Photocurable adhesive composition ETERNAL MATERIALS CO., LTD. (TW) 2015-05-12 US claimed
US-20120172477-A1 PHOTOCURABLE ADHESIVE COMPOSITION ETERNAL MATERIALS CO., LTD. (TW) 2012-07-05 US claimed
US-8114499-B2 Optical film containing organic particles having narrow particle size distribution ETERNAL CHEMICAL CO., LTD. (TW) 2012-02-14 US claimed
US-8110278-B2 Scratch-resistant optical film having organic particles with highly uniform particle size ETERNAL CHEMICAL CO., LTD. (TW) 2012-02-07 US claimed
US-7833622-B2 transparent substrate and resin coating having convex-concave structure on surface; coating comprises a plurality of organic particles and binder, the particles being formed from a polyacrylate resin comprising at least one mono-functional and at least one multi-functional acrylate monomer; luminance ETERNAL CHEMICAL CO., LTD. (CN) 2010-11-16 US claimed
US-20090220742-A1 BRIGHTNESS ENHANCEMENT REFLECTIVE FILM ETERNAL CHEMICAL CO., LTD., 2009-09-03 US claimed
US-20080311352-A1 transparent substrate and resin coating having convex-concave structure on surface; coating comprises a plurality of organic particles and binder, the particles being formed from a polyacrylate resin comprising at least one mono-functional and at least one multi-functional acrylate monomer; luminance ETERNAL CHEMICAL CO., LTD. 2008-12-18 US claimed
US-20080311351-A1 Scratch-resistant optical film having organic particles with highly uniform particle size ETERNAL CHEMICAL CO., LTD. 2008-12-18 US claimed
US-20080305301-A1 Optical film containing organic particles having narrow particle size distribution ETERNAL CHEMICAL CO., LTD. 2008-12-11 US claimed
WO-2025105345-A1 RESIN COMPOSITION, CURED PRODUCT, LAYERED BODY, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAYERED BODY, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2025-05-22 WO disclosed
WO-2025105331-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2025-05-22 WO disclosed
WO-2025105367-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING RESIN 富士フイルム株式会社 2025-05-22 WO disclosed
CN-119937247-A Curable resin composition, resin film, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2025-05-06 CN disclosed
WO-2025063182-A1 STACK AND METHOD FOR MANUFACTURING STACK 富士フイルム株式会社 2025-03-27 WO disclosed
CN-101315160-A Optical film with non-spherical particles ETERNAL CHEMICAL INDUSTRY CO LTD (CN) 2008-12-03 CN disclosed
CN-101241207-A Reflecting film CHANGXING OPTICAL MATERIAL SUZ (CN) 2008-08-13 CN disclosed
CN-101162276-A Optical film ETERNAL CHEMICAL INDUSTRY CO LTD (CN) 2008-04-16 CN disclosed
CN-101153926-A Optical thin film with resin coating containing narrow particle size distributed organic particle CHANGXING OPTICAL MATERIAL SUZ (CN) 2008-04-02 CN disclosed
CN-101131443-A Optical thin film of organic particle with narrow particle size distribution CHANGXING OPTICAL MATERIALS SU (CN) 2008-02-27 CN disclosed
CN-101067665-A Anti scraping optical film containing enen size organic particles CHANGXING OPTICAL MATERIALS SU (CN) 2007-11-07 CN disclosed