Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.33 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.30 |
| ▸ | FAAH | O00519 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL3506816 | 0.79 | LMNA (0.34) | LMNACHRM2CHRM4CHRM1TSHR | |
| Hydrochloric Acid SCHEMBL3507188 | 0.79 | LMNA (0.34) | LMNACHRM2CHRM4CHRM1TSHR | |
| SCHEMBL18274692 | 0.79 | ALDH1A1 (0.35) | LMNACHRM2CHRM4CHRM1TSHR | |
| Hydrochloric Acid SCHEMBL3506823 | 0.79 | LMNA (0.34) | LMNACHRM2CHRM4CHRM1TSHR | |
| Bromide SCHEMBL11516935 | 0.77 | LMNA (0.33) | LMNACHRM2CHRM4CHRM1TSHR | |
| SCHEMBL10489965 | 0.77 | LMNA (0.33) | LMNACHRM2CHRM4CHRM1TSHR | |
| SCHEMBL11468912 | 0.75 | TSHR (0.38) | LMNACHRM2CHRM4CHRM1TSHR | |
| SCHEMBL11346817 | 0.75 | TSHR (0.38) | LMNACHRM2CHRM4CHRM1TSHR | |
| SCHEMBL3504870 | 0.73 | — | — | |
| SCHEMBL28465342 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230120132-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-20 | — | — | US | disclosed |