SCHEMBL25159

SCHEMBL25159

CC(O)C(O)c1ccccc1

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.65
LMNA P02545 3/20 0.65
ADRA2C P18825 2/20 0.65
ADRA2A P08913 1/20 0.65
HIF1A Q16665 1/20 0.65
ALDH1A1 P00352 3/20 0.62
TSHR P16473 2/20 0.60
CHRM2 P08172 1/20 0.60
ADRA1A P35348 1/20 0.60
RGS12 O14924 1/20 0.60
GLA P06280 1/20 0.60
CYP3A4 P08684 1/20 0.60
CYP2D6 P10635 1/20 0.60
CYP2C9 P11712 1/20 0.60
PKM P14618 1/20 0.60
ALOX15 P16050 1/20 0.60
ALOX12 P18054 1/20 0.60
NFKB1 P19838 1/20 0.60
HTR2A P28223 1/20 0.60
CYP2C19 P33261 1/20 0.60

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL517001 1.00 KDM4E (0.65) KDM4ELMNAADRA2CADRA2AHIF1A
SCHEMBL6543382 1.00 KDM4E (0.65) KDM4ELMNAADRA2CADRA2AHIF1A
SCHEMBL28117044 1.00 KDM4E (0.65) KDM4ELMNAADRA2CADRA2AHIF1A
SCHEMBL6689612 1.00 KDM4E (0.65) KDM4ELMNAADRA2CADRA2AHIF1A
SCHEMBL6483432 1.00 KDM4E (0.65) KDM4ELMNAADRA2CADRA2AHIF1A
SCHEMBL5353745 1.00 KDM4E (0.65) KDM4ELMNAADRA2CADRA2AHIF1A
SCHEMBL1954690 1.00 KDM4E (0.65) KDM4ELMNAADRA2CADRA2AHIF1A
SCHEMBL12761516 1.00 KDM4E (0.65) KDM4ELMNAADRA2CADRA2AHIF1A
Bicarbonate SCHEMBL4901524 0.93 LMNA (0.58) KDM4ELMNAADRA2CADRA2AHIF1A
SCHEMBL28002029 0.93 KDM4E (0.58) KDM4ELMNAADRA2CADRA2AHIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 634 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4155343-B1 LATEX COMPOSITION SUMITOMO SEIKA CHEMICALS (JP) 2026-04-29 EP claimed
CN-119928264-A Multi-material 3D printing device based on photo-thermal coupling effect and forming method thereof 北京工业大学 2025-05-06 CN claimed
CN-119865979-A High-weldability circuit board surface treatment liquid and preparation method thereof 深圳市华京超导材料有限公司 2025-04-22 CN claimed
WO-2025053791-A1 ONE-POT GRAFTING OF POLYMERS FROM ALCOHOLS AND BIOMASSES NANYANG TECHNOLOGICAL UNIVERSITY (SG) 2025-03-13 WO claimed
EP-4512612-A2 POLYETHERS CONTAINING NON-BISPHENOLIC CYCLIC GROUPS Swimc LLC (US) 2025-02-26 EP claimed
CN-118895089-A Photo-cured jade adhesive and preparation method and application thereof 华南理工大学 2024-11-05 CN claimed
CN-117025012-B Thermo-optical dual-curing amphiphilic anti-fog coating composition and anti-fog film 重庆清工新业材料科技有限公司 2024-10-22 CN claimed
CN-118496763-A Hydroxide ion machine with active coating 深圳微子医疗有限公司 2024-08-16 CN claimed
CN-115124635-B Deashing method of polyolefin material 山东京博石油化工有限公司 2024-07-30 CN claimed
CN-117898949-A Enzyme-resistant nano molecular sieve composite material and application thereof 吉林大学 2024-04-19 CN claimed
EP-0842250-A1 CONCENTRATED, STABLE FABRIC SOFTENING COMPOSITION THE PROCTER & GAMBLE COMPANY (US) 1998-05-20 EP claimed
EP-0839179-A1 CONCENTRATED, WATER DISPERSIBLE, STABLE, FABRIC SOFTENING COMPOSITIONS THE PROCTER & GAMBLE COMPANY (US) 1998-05-06 EP claimed
US-5747443-A BIODEGRADABLE QUATERNARY AMMONIUM COMPOUNDS THE PROCTER & GAMBLE COMPANY (US) 1998-05-05 US claimed
WO-1998017756-A1 CONCENTRATED FABRIC SOFTENING COMPOSITION THE PROCTER & GAMBLE COMPANY (US) 1998-04-30 WO claimed
WO-1998011882-A1 PHARMACEUTICAL COMPOSITIONS AND METHODS CODON PHARMACEUTICALS, INC. (US) 1998-03-26 WO claimed
WO-1997034972-A1 FABRIC SOFTENING COMPOUND/COMPOSITION THE PROCTER & GAMBLE COMPANY (US) 1997-09-25 WO claimed
WO-1997003170-A1 CONCENTRATED, WATER DISPERSIBLE, STABLE, FABRIC SOFTENING COMPOSITIONS THE PROCTER & GAMBLE COMPANY (US) 1997-01-30 WO claimed
WO-1997003169-A1 CONCENTRATED, STABLE FABRIC SOFTENING COMPOSITION THE PROCTER & GAMBLE COMPANY (US) 1997-01-30 WO claimed
EP-0317998-A2 Manufacturing method of optically-active 1,2-diols KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1989-05-31 EP claimed
US-4540650-A Photoresists suitable for forming relief structures of highly heat-resistant polymers MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1985-09-10 US claimed