SCHEMBL2519657

SCHEMBL2519657

C=Cc1ccc(COc2ccccc2)c2ccccc12

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 2/20 0.39
NPC1 O15118 2/20 0.39
KDM4E B2RXH2 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
SIRT2 Q8IXJ6 1/20 0.38
KCNH2 Q12809 2/20 0.37
FFAR1 O14842 2/20 0.37
AKR1B1 P15121 1/20 0.37
PARP10 Q53GL7 1/20 0.36
APP P05067 1/20 0.36
CYSLTR2 Q9NS75 1/20 0.36
CYSLTR1 Q9Y271 1/20 0.36
KCNA3 P22001 1/20 0.35
THRB P10828 1/20 0.35
PTPRC P08575 1/20 0.35
PTPN1 P18031 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2519003 0.79 GCGR (0.32)
SCHEMBL2519704 0.79 GCGR (0.42) RAB9ANPC1KDM4ESMN1; SMN2
SCHEMBL11215052 0.79 SMN1; SMN2 (0.46) RAB9ANPC1KDM4ESMN1; SMN2KCNH2
SCHEMBL18885507 0.76 HSD17B3 (0.37) RAB9ANPC1KDM4E
SCHEMBL1976914 0.74 GCGR (0.39) RAB9ANPC1KDM4ESMN1; SMN2
SCHEMBL2516287 0.73 ALDH1A1 (0.45) KDM4ESMN1; SMN2
SCHEMBL29434197 0.73 ALDH1A1 (0.48) RAB9AKDM4ESMN1; SMN2SIRT2KCNH2
SCHEMBL4507349 0.73 CNR2 (0.39)
SCHEMBL9049792 0.73 ALDH1A1 (0.39)
SCHEMBL2100602 0.73 ALDH1A1 (0.48) RAB9AKDM4ESMN1; SMN2SIRT2KCNH2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8334338-B2 Composition for forming resist lower layer film JSR CORPORATION (JP) 2012-12-18 US disclosed
US-20110251323-A1 COMPOSITION FOR FORMING RESIST LOWER LAYER FILM JSR CORPORATION 2011-10-13 US disclosed
EP-1386904-B1 Acenaphthylene derivative, polymer, and antireflection film-forming composition JSR CORP (JP) 2008-09-17 EP disclosed
US-7037994-B2 Acenaphthylene derivative, polymer, and antireflection film-forming composition JSR CORPORATION (JP) 2006-05-02 US disclosed
US-20040034155-A1 Acenaphthylene derivative, polymer, and antireflection film-forming composition JSR CORPORATION (JP) 2004-02-19 US disclosed
EP-1386904-A1 Acenaphthylene derivative, polymer, and antireflection film-forming composition JSR Corporation (JP) 2004-02-04 EP disclosed