Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 5/20 | 0.53 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.53 |
| ▸ | PTGS2 | P35354 | 7/20 | 0.50 |
| ▸ | AKR1C3 | P42330 | 7/20 | 0.50 |
| ▸ | PTGS1 | P23219 | 6/20 | 0.50 |
| ▸ | AKR1C2 | P52895 | 6/20 | 0.50 |
| ▸ | CYP2C9 | P11712 | 5/20 | 0.50 |
| ▸ | ESR1 | P03372 | 3/20 | 0.50 |
| ▸ | CXCR1 | P25024 | 2/20 | 0.50 |
| ▸ | CXCR2 | P25025 | 2/20 | 0.50 |
| ▸ | ALB | P02768 | 1/20 | 0.50 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.50 |
| ▸ | RARB | P10826 | 1/20 | 0.50 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.50 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.50 |
| ▸ | HTR2A | P28223 | 1/20 | 0.50 |
| ▸ | NR1I3 | Q14994 | 1/20 | 0.50 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.50 |
| ▸ | CXCL8 | P10145 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL819392 | 0.91 | LMNA (0.61) | LMNAHSD17B10PTGS2AKR1C3PTGS1 | |
| SCHEMBL7431730 | 0.86 | PTGS2 (0.56) | LMNAHSD17B10PTGS2AKR1C3PTGS1 | |
| Butane SCHEMBL27363299 | 0.85 | PTGS2 (0.56) | LMNAPTGS2AKR1C3PTGS1AKR1C2 | |
| SCHEMBL1345582 | 0.85 | PTGS2 (0.63) | LMNAPTGS2AKR1C3PTGS1AKR1C2 | |
| SCHEMBL892055 | 0.85 | PTGS2 (0.63) | LMNAPTGS2AKR1C3PTGS1AKR1C2 | |
| SCHEMBL288003 | 0.85 | PTGS2 (0.63) | LMNAPTGS2AKR1C3PTGS1AKR1C2 | |
| Hydrochloric Acid SCHEMBL28716582 | 0.83 | PTGS2 (0.61) | LMNAPTGS2AKR1C3PTGS1AKR1C2 | |
| SCHEMBL9232479 | 0.83 | PTGS2 (0.61) | LMNAPTGS2AKR1C3PTGS1AKR1C2 | |
| SCHEMBL9232475 | 0.83 | PTGS2 (0.61) | LMNAPTGS2AKR1C3PTGS1AKR1C2 | |
| SCHEMBL9234136 | 0.83 | PTGS2 (0.61) | LMNAPTGS2AKR1C3PTGS1AKR1C2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2618216-B1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT | HITACHI CHEMICAL CO LTD (JP) | 2019-05-29 | — | — | EP | disclosed |
| US-9786576-B2 | Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device | HITACHI CHEMICAL COMPANY, LTD (JP) | 2017-10-10 | — | — | US | disclosed |
| US-8836089-B2 | Positive photosensitive resin composition, method of creating resist pattern, and electronic component | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| EP-2221666-B1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCTION OF RESIST PATTERN, AND SEMICONDUCTOR DEVICE | HITACHI CHEMICAL CO LTD (JP) | 2013-09-18 | — | — | EP | disclosed |
| EP-2618216-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT | Hitachi Chemical Co., Ltd. (JP) | 2013-07-24 | — | — | EP | disclosed |
| US-20130168859-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT | RESONAC CORPORATION (JP) | 2013-07-04 | — | — | US | disclosed |
| US-20110250396-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCTION OF RESIST PATTERN, SEMICONDUCTOR DEVICE, AND ELECTRONIC DEVICE | RESONAC CORPORATION (JP) | 2011-10-13 | — | — | US | disclosed |
| EP-2221666-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCTION OF RESIST PATTERN, SEMICONDUCTOR DEVICE, AND ELECTRONIC DEVICE | Hitachi Chemical Company, Ltd. (JP) | 2010-08-25 | — | — | EP | disclosed |