Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK13 | O15264 | 6/20 | 0.85 |
| ▸ | MAPK12 | P53778 | 6/20 | 0.85 |
| ▸ | MAPK11 | Q15759 | 6/20 | 0.85 |
| ▸ | MAPK14 | Q16539 | 6/20 | 0.85 |
| ▸ | MAPT | P10636 | 4/20 | 0.85 |
| ▸ | RAF1 | P04049 | 4/20 | 0.85 |
| ▸ | TP53 | P04637 | 3/20 | 0.85 |
| ▸ | GCGR | P47871 | 3/20 | 0.85 |
| ▸ | BRAF | P15056 | 2/20 | 0.85 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.72 |
| ▸ | SMPD3 | Q9NY59 | 1/20 | 0.69 |
| ▸ | NOX1 | Q9Y5S8 | 2/20 | 0.68 |
| ▸ | MAPK9 | P45984 | 2/20 | 0.68 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.64 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.64 |
| ▸ | HPGD | P15428 | 2/20 | 0.64 |
| ▸ | GLA | P06280 | 1/20 | 0.64 |
| ▸ | GAA | P10253 | 1/20 | 0.64 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.64 |
| ▸ | CIT | O14578 | 1/20 | 0.64 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9619859 | 1.00 | MAPK13 (0.85) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL5307418 | 1.00 | MAPK13 (0.85) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL15401173 | 1.00 | MAPK13 (0.85) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL18292488 | 1.00 | MAPK13 (0.85) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL31255400 | 0.98 | MAPK13 (0.83) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL12561713 | 0.98 | MAPK13 (0.83) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL8010209 | 0.93 | NOX1 (0.76) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL28486758 | 0.92 | MAPK14 (1.00) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL6469877 | 0.92 | MAPK14 (1.00) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL12561692 | 0.92 | MAPK13 (1.00) | MAPK13MAPK12MAPK11MAPK14MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 530 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4321541-B1 | RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD AND SEMICONDUCTOR DEVICE | MITSUBISHI GAS CHEMICAL CO (JP) | 2025-08-06 | — | — | EP | claimed |
| EP-4321541-A1 | RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD AND SEMICONDUCTOR DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-02-14 | — | — | EP | claimed |
| CN-117529509-A | Resin composition, resin sheet, multilayer printed wiring board, and semiconductor device | 三菱瓦斯化学株式会社 | 2024-02-06 | — | — | CN | claimed |
| WO-2022264985-A1 | RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD AND SEMICONDUCTOR DEVICE | 三菱瓦斯化学株式会社 | 2022-12-22 | — | — | WO | claimed |
| CN-112592666-B | 360-DEG C-resistant high-temperature epoxy adhesive and preparation method and application thereof | 康达新材料(集团)股份有限公司 | 2022-11-25 | — | — | CN | claimed |
| CN-112592666-A | 360-DEG C-resistant high-temperature epoxy adhesive and preparation method and application thereof | 上海康达化工新材料集团股份有限公司 | 2021-04-02 | — | — | CN | claimed |
| WO-2016039960-A1 | LASER REACTIVE WATER-BASED INKS MANUFACTURED FROM WATER-BASED MASTERBATCH CONCENTRATES | SUN CHEMICAL CORPORATION (US) | 2016-03-17 | — | — | WO | claimed |
| WO-2015183931-A1 | STABILIZED CHEMILUMINESCENT SYSTEM | LI-COR, INC. (US) | 2015-12-03 | — | — | WO | claimed |
| US-20150346202-A1 | STABILIZED CHEMILUMINESCENT SYSTEM | Ll-COR, INC. (US) | 2015-12-03 | — | — | US | claimed |
| CN-102854748-B | Photosensitive composition and application thereof | ZHEJIANG RONGTAI TECHNOLOGY ENTPR CO LTD | 2014-05-21 | — | — | CN | claimed |
| EP-1264212-A2 | ELEMENTS FOR FORMING PRINT-OUT IMAGES | E. I. du Pont de Nemours and Company (US) | 2002-12-11 | — | — | EP | claimed |
| US-20020146649-A1 | Elements for forming print-out images | E. I. DU PONT DE NEMOURS AND COMPANY | 2002-10-10 | — | — | US | claimed |
| WO-2001067175-A2 | ELEMENTS FOR FORMING PRINT-OUT IMAGES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2001-09-13 | — | — | WO | claimed |
| US-6251571-B1 | MIXTURE OF OXIDIZER, DYE AND HYDROXYLAMINE | E. I. DU PONT DE NEMOURS AND COMPANY | 2001-06-26 | — | — | US | claimed |
| EP-0941866-A1 | Non-photosensitive, thermally imageable element having improved room light stability | E. I. du Pont de Nemours and Company (US) | 1999-09-15 | — | — | EP | claimed |
| US-5744280-A | MONOCHROME IMAGES;IMPROVED CONTRAST | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-04-28 | — | — | US | claimed |
| EP-0828182-A1 | Storage-stable photoimageable compositions with improved leuco dye | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-03-11 | — | — | EP | claimed |
| US-5055373-A | Support with coating layer of microcapsules containing leuco dyes and photooxidizer and external reducing agent | FUJI PHOTO FILM CO., LTD. (JP) | 1991-10-08 | — | — | US | claimed |
| US-4929530-A | OXIDATIVE LEUCO DYES, PHOTO-OXIDIZERS, REDUCING AGENTS, ORGANIC SULFONAMIDES AND PHENOLIC COMPONENTS; EXPOSING TO LIGHT | FUJI PHOTO FILM CO., LTD. (JP) | 1990-05-29 | — | — | US | claimed |
| US-4634657-A | AND A LEEVCO DYE, MONOMERIC COMPOUND AND PHOTOINIATOR; IMPROVED PRINTOUT CAPABILITIES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-01-06 | — | — | US | claimed |