⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30845991 | 0.80 | MEN1 (0.33) | — | |
| SCHEMBL17960 | 0.80 | — | — | |
| Methane SCHEMBL27823989 | 0.78 | DGAT1 (0.42) | — | |
| Hydrochloric Acid SCHEMBL27904289 | 0.78 | DGAT1 (0.42) | — | |
| SCHEMBL101218 | 0.77 | DGAT1 (0.46) | — | |
| SCHEMBL284141 | 0.77 | APLNR (0.55) | — | |
| SCHEMBL1522412 | 0.74 | DGAT1 (0.44) | — | |
| SCHEMBL9409065 | 0.74 | — | — | |
| Potassium SCHEMBL29554503 | 0.74 | DGAT1 (0.44) | — | |
| SCHEMBL303868 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 322 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170178899-A1 | DIRECTIONAL DEPOSITION ON PATTERNED STRUCTURES | LAM RESEARCH CORPORATION | 2017-06-22 | — | — | US | claimed |
| US-8993460-B2 | Apparatuses and methods for depositing SiC/SiCN films via cross-metathesis reactions with organometallic co-reactants | NOVELLUS SYSTEMS, INC. (US) | 2015-03-31 | — | — | US | claimed |
| US-20140193983-A1 | APPARATUSES AND METHODS FOR DEPOSITING SiC/SiCN FILMS VIA CROSS-METATHESIS REACTIONS WITH ORGANOMETALLIC CO-REACTANTS | NOVELLUS SYSTEMS, INC. | 2014-07-10 | — | — | US | claimed |
| US-20260090294-A1 | DOPED SILICON OR BORON LAYER FORMATION | LAM RES CORP (US) | 2026-03-26 | — | — | US | disclosed |
| US-20260090293-A1 | SEMICONDUCTOR STACKS AND PROCESSES THEREOF | LAM RES CORP (US) | 2026-03-26 | — | — | US | disclosed |
| US-12588475-B2 | High selectivity doped hardmask films | LAM RESEARCH CORPORATION (US) | 2026-03-24 | — | — | US | disclosed |
| US-20260076110-A1 | HYBRID ATOMIC LAYER DEPOSITION | LAM RES CORP (US) | 2026-03-12 | — | — | US | disclosed |
| US-20260047361-A1 | METHOD AND APPARATUS FOR ATOMIC LAYER DEPOSITION USING MULTIPLE CHAMBERS | NATIONAL TSING HUA UNIVERSITY (TW) | 2026-02-12 | — | — | US | disclosed |
| US-20250385088-A1 | BACKSIDE LAYER FOR A SEMICONDUCTOR SUBSTRATE | LAM RES CORP (US) | 2025-12-18 | — | — | US | disclosed |
| US-20250372367-A1 | DEPOSITION AND ETCH OF SILICON-CONTAINING LAYER | LAM RES CORP (US) | 2025-12-04 | — | — | US | disclosed |
| EP-4651192-A2 | UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION | Lam Research Corporation (US) | 2025-11-19 | — | — | EP | disclosed |
| US-20140030444-A1 | HIGH PRESSURE, HIGH POWER PLASMA ACTIVATED CONFORMAL FILM DEPOSITION | NOVELLUS SYSTEMS, INC. (US) | 2014-01-30 | — | — | US | disclosed |
| US-8592328-B2 | Method for depositing a chlorine-free conformal sin film | NOVELLUS SYSTEMS, INC. (US) | 2013-11-26 | — | — | US | disclosed |
| WO-2013112727-A1 | METHODS FOR UV-ASSISTED CONFORMAL FILM DEPOSITION | NOVELLUS SYSTEMS, INC. (US) | 2013-08-01 | — | — | WO | disclosed |
| US-20130196516-A1 | METHODS FOR UV-ASSISTED CONFORMAL FILM DEPOSITION | LAVOIE ADRIEN (US) | 2013-08-01 | — | — | US | disclosed |
| US-20130189854-A1 | METHOD FOR DEPOSITING A CHLORINE-FREE CONFORMAL SIN FILM | NOVELLUS SYSTEMS, INC. | 2013-07-25 | — | — | US | disclosed |
| EP-2618365-A2 | Method for depositing a chlorine-free conformal SiN film | Novellus Systems, Inc. (US) | 2013-07-24 | — | — | EP | disclosed |
| WO-2011130397-A2 | IMPROVED SILICON NITRIDE FILMS AND METHODS | NOVELLUS SYSTEMS, INC. (US) | 2011-10-20 | — | — | WO | disclosed |
| US-20110256734-A1 | SILICON NITRIDE FILMS AND METHODS | NOVELLUS SYSTEMS, INC. | 2011-10-20 | — | — | US | disclosed |
| US-20110256734-A1 | SILICON NITRIDE FILMS AND METHODS | NOVELLUS SYSTEMS, INC. | 2011-10-20 | — | — | US | disclosed |