Methacrylic Acid

Methacrylic Acid

SCHEMBL25428526

C=C(C)C(=O)O.C=C(C)C(=O)O.C=CC(=O)O.CC(C)(CO)CO

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 1/20 0.42
HSD17B10 Q99714 1/20 0.42
LMNA P02545 1/20 0.42
ALDH1A1 P00352 4/20 0.35
TET2 Q6N021 1/20 0.32
TP53 P04637 2/20 0.31
CYP3A4 P08684 1/20 0.31
MAPK1 P28482 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
HIF1A Q16665 1/20 0.31
TSHR P16473 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL2022885 1.00 ALOX15 (0.42) ALOX15HSD17B10LMNAALDH1A1TET2
Methacrylic Acid SCHEMBL30601872 1.00 ALOX15 (0.42) ALOX15HSD17B10LMNAALDH1A1TET2
Methacrylic Acid SCHEMBL4382808 0.89 TET2 (0.38) ALDH1A1TET2TSHR
Methacrylic Acid SCHEMBL8509424 0.89 TET2 (0.38) ALDH1A1TET2TSHR
Methacrylic Acid SCHEMBL18812640 0.89 TET2 (0.38) ALDH1A1TET2TSHR
Methacrylic Acid SCHEMBL23611338 0.89 TET2 (0.38) ALDH1A1TET2TSHR
Methacrylic Acid SCHEMBL23107 0.89 TET2 (0.38) ALDH1A1TET2TSHR
Methacrylic Acid SCHEMBL15667140 0.89 TET2 (0.38) ALDH1A1TET2TSHR
Methacrylic Acid SCHEMBL505626 0.89 TET2 (0.38) ALDH1A1TET2TSHR
Acrylic Acid SCHEMBL8864275 0.89 LMNA (0.53) ALOX15HSD17B10LMNAALDH1A1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023123186-A1 ELECTRODE ASSEMBLY, SECONDARY BATTERY, BATTERY MODULE, BATTERY PACK, AND ELECTRIC DEVICE 宁德时代新能源科技股份有限公司 2023-07-06 WO claimed
CN-110035722-A Method for etching an absorbing structure 宝洁公司 2019-07-19 CN disclosed
CN-110022825-A Absorbing structure 宝洁公司 2019-07-16 CN disclosed
CN-108348380-A Absorbent article slim and flexible 宝洁公司 2018-07-31 CN disclosed
CN-104220240-B Method of dewatering in a continuous high internal phase emulsion foam forming process 宝洁公司 2017-05-03 CN disclosed
CN-106456410-A Heterogeneous block comprising foam 宝洁公司 2017-02-22 CN disclosed
CN-106456825-A Heterogeneous block comprising foam 宝洁公司 2017-02-22 CN disclosed
CN-106456824-A Heterogeneous block comprising foam 宝洁公司 2017-02-22 CN disclosed
CN-104220240-A Method of dewatering in a continuous high internal phase emulsion foam forming process PROCTER & GAMBLE 2014-12-17 CN disclosed