⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Alcohol SCHEMBL28550512 | 0.94 | — | — | |
| Urea SCHEMBL28075397 | 0.89 | ALOX5 (0.30) | — | |
| SCHEMBL16396664 | 0.83 | — | — | |
| SCHEMBL4031018 | 0.80 | — | — | |
| SCHEMBL25242195 | 0.80 | — | — | |
| SCHEMBL2797598 | 0.78 | — | — | |
| SCHEMBL29033922 | 0.77 | DNM1 (0.33) | — | |
| SCHEMBL439734 | 0.74 | LMNA (0.30) | — | |
| SCHEMBL1136164 | 0.74 | — | — | |
| SCHEMBL557329 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 195 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114516699-B | Method for treating coating waste liquid of lithium ion battery diaphragm | 深圳市德尼环境技术有限公司 | 2023-04-07 | — | — | CN | claimed |
| CN-111849412-B | Organic silicon adhesive for fixing medium-sized nanocrystalline magnetic core and preparation method thereof | 杭州先创高新材料有限公司 | 2023-03-21 | — | — | CN | claimed |
| CN-115785896-A | Preparation method of dealcoholized organosilicon sealant | 杭州之江有机硅化工有限公司 | 2023-03-14 | — | — | CN | claimed |
| CN-111718665-B | Adhesive film for packaging photovoltaic module with multilayer structure and preparation method thereof | 杭州福斯特应用材料股份有限公司 | 2022-11-22 | — | — | CN | claimed |
| CN-115198515-A | Non-woven fabric with acid dye adsorption effect and preparation method and application thereof | 杭州循空生物科技有限公司 | 2022-10-18 | — | — | CN | claimed |
| CN-115181541-A | Silicon rubber sealant for bonding LED lamp tube and lamp strip and preparation method thereof | 杭州之江有机硅化工有限公司 | 2022-10-14 | — | — | CN | claimed |
| CN-115124974-A | Dealcoholized organosilicon sealant and preparation method thereof | 福建省昌德胶业科技有限公司 | 2022-09-30 | — | — | CN | claimed |
| CN-107400471-B | Adhesive film for packaging photovoltaic module with multilayer structure and preparation method thereof | 杭州福斯特应用材料股份有限公司 | 2022-07-22 | — | — | CN | claimed |
| CN-114032085-B | Efficient gas suspension proppant for fracturing and preparation method thereof | 成都理工大学 | 2022-07-15 | — | — | CN | claimed |
| CN-114716923-A | Photovoltaic packaging adhesive film | 杭州福斯特应用材料股份有限公司 | 2022-07-08 | — | — | CN | claimed |
| EP-3083721-B1 | CATALYST SYSTEM FOR POLYMERISATION OF AN OLEFIN | SAUDI BASIC IND CORP (SA) | 2019-08-14 | — | — | EP | claimed |
| CN-105940023-B | Catalyst system for olefinic polymerization | 沙特基础工业公司 | 2019-01-18 | — | — | CN | claimed |
| US-9944734-B2 | Catalyst system for polymerization of an olefin | SAUDI BASIC INDUSTRIES CORPORATION (SA) | 2018-04-17 | — | — | US | claimed |
| CN-107216593-A | A kind of graphene enhancing heat-proof polythene composite pipe and preparation method thereof | 吉林省慧燊节能科技有限公司 | 2017-09-29 | — | — | CN | claimed |
| US-20160326280-A1 | CATALYST SYSTEM FOR POLYMERIZATION OF AN OLEFIN | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2016-11-10 | — | — | US | claimed |
| EP-3083721-A1 | CATALYST SYSTEM FOR POLYMERISATION OF AN OLEFIN | Saudi Basic Industries Corporation (SA) | 2016-10-26 | — | — | EP | claimed |
| WO-2015091940-A1 | CATALYST SYSTEM FOR POLYMERISATION OF AN OLEFIN | SAUDI BASIC INDUSTRIES CORPORATION (SA) | 2015-06-25 | — | — | WO | claimed |
| CN-101128264-B | Modified amine-aldehyde resins and uses thereof in separation processes | GEORGIA PACIFIC RESINS | 2013-05-29 | — | — | CN | claimed |
| CN-101410481-B | Composition for etching a metal hard mask material in semiconductor processing | INTEL CORP | 2012-10-24 | — | — | CN | claimed |
| CN-101410481-A | Composition for etching a metal hard mask material in semiconductor processing | INTEL CORP (US) | 2009-04-15 | — | — | CN | claimed |