Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.48 |
| ▸ | NPC1 | O15118 | 2/20 | 0.42 |
| ▸ | RAB9A | P51151 | 2/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | RECQL | P46063 | 1/20 | 0.40 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25475197 | 0.89 | HDAC6 (0.47) | HDAC6NPC1RAB9AHTTSMN1; SMN2 | |
| SCHEMBL11404384 | 0.82 | RAB9A (0.51) | HDAC6NPC1RAB9AHTTSMN1; SMN2 | |
| SCHEMBL28236281 | 0.79 | SMN1; SMN2 (0.49) | HDAC6NPC1RAB9AHTTSMN1; SMN2 | |
| SCHEMBL25736817 | 0.79 | NR1H2 (0.40) | HDAC6TSHRMAPTALDH1A1GAA | |
| SCHEMBL1160658 | 0.78 | MAPT (0.49) | HDAC6NPC1RAB9AHTTSMN1; SMN2 | |
| SCHEMBL14369862 | 0.75 | NPC1 (0.55) | HDAC6NPC1RAB9AHTTTSHR | |
| SCHEMBL30189629 | 0.70 | SMN1; SMN2 (0.57) | NPC1RAB9AHTTSMN1; SMN2MAPT | |
| SCHEMBL459471 | 0.70 | SMN1; SMN2 (0.57) | NPC1RAB9AHTTSMN1; SMN2MAPT | |
| SCHEMBL13543523 | 0.69 | RAB9A (0.54) | HDAC6NPC1RAB9AHTTSMN1; SMN2 | |
| SCHEMBL25736830 | 0.69 | PIN1 (0.39) | HTTTSHRMAPTALDH1A1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230161255-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |