Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2A | P28223 | 1/20 | 0.41 |
| ▸ | OPRM1 | P35372 | 5/20 | 0.40 |
| ▸ | OPRD1 | P41143 | 3/20 | 0.39 |
| ▸ | OPRK1 | P41145 | 3/20 | 0.39 |
| ▸ | DRD3 | P35462 | 1/20 | 0.37 |
| ▸ | ACE | P12821 | 1/20 | 0.36 |
| ▸ | TACR1 | P25103 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25475294 | 0.92 | OPRM1 (0.38) | HTR2AOPRM1OPRD1OPRK1DRD3 | |
| SCHEMBL25475280 | 0.92 | OPRM1 (0.45) | HTR2AOPRM1OPRD1OPRK1DRD3 | |
| SCHEMBL25475388 | 0.89 | HTR2A (0.42) | HTR2AOPRM1OPRD1OPRK1DRD3 | |
| SCHEMBL25737512 | 0.84 | OPRM1 (0.34) | OPRM1OPRD1OPRK1 | |
| SCHEMBL25475383 | 0.81 | OPRM1 (0.39) | HTR2AOPRM1OPRD1OPRK1DRD3 | |
| SCHEMBL25475398 | 0.80 | OPRM1 (0.47) | HTR2AOPRM1OPRD1OPRK1DRD3 | |
| SCHEMBL25475303 | 0.80 | DRD2 (0.39) | DRD3 | |
| SCHEMBL26413963 | 0.79 | OPRM1 (0.46) | OPRM1OPRD1OPRK1DRD3TACR1 | |
| SCHEMBL26413968 | 0.79 | OPRM1 (0.46) | OPRM1OPRD1OPRK1DRD3TACR1 | |
| SCHEMBL3908513 | 0.79 | HTR2A (0.46) | HTR2AOPRM1OPRD1OPRK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230161255-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161255-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230152698-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |