SCHEMBL25475404

SCHEMBL25475404

CC(S)C(=O)OC1(c2ccccc2)CCCNC1

nearest known ligand 0.39

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 4/20 0.39
HTR2A P28223 1/20 0.36
SLC6A9 P48067 1/20 0.35
APOBEC3A P31941 2/20 0.34
APOBEC3G Q9HC16 2/20 0.34
HSD17B10 Q99714 1/20 0.34
ALDH1A1 P00352 3/20 0.33
PRCP P42785 1/20 0.33
SIGMAR1 Q99720 1/20 0.33
OPRD1 P41143 3/20 0.33
OPRK1 P41145 3/20 0.33
POLB P06746 1/20 0.33
AKR1C1 Q04828 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25475403 0.92 OPRM1 (0.43) OPRM1HTR2AAPOBEC3AAPOBEC3GPRCP
SCHEMBL25475401 0.89 KDM1A (0.33) OPRM1
SCHEMBL25475402 0.88 MAPT (0.33) OPRM1ALDH1A1
SCHEMBL23870814 0.87 OPRM1 (0.39) OPRM1HTR2ASLC6A9APOBEC3AAPOBEC3G
SCHEMBL26785466 0.84 OPRM1 (0.37) OPRM1HTR2ASLC6A9APOBEC3AAPOBEC3G
SCHEMBL25475417 0.84 OPRM1 (0.48) OPRM1HTR2AAPOBEC3AAPOBEC3GOPRD1
SCHEMBL23870805 0.79 OPRM1 (0.43) OPRM1SLC6A9APOBEC3AAPOBEC3GALDH1A1
SCHEMBL23870806 0.79 OPRM1 (0.43) OPRM1HTR2AAPOBEC3AAPOBEC3GOPRD1
SCHEMBL25475383 0.79 OPRM1 (0.39) OPRM1HTR2ASLC6A9APOBEC3AAPOBEC3G
SCHEMBL23870804 0.77 OPRM1 (0.44) OPRM1HTR2ASLC6A9APOBEC3AAPOBEC3G

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed